Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors

Arriola, Alexander; Rodríguez, Ainara; Pérez, Noemí; Tavera, T.; Withford, Michael J.; Fuerbach, Alexander; Olaizola, Santiago M.

doi:10.1364/ome.2.001571

Cited by 29 publications

(10 citation statements)

References 35 publications

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“…The total processed area depends on the beam intensity and coherence length of the laser and can be up to dozens, or even hundreds of square centimeters. The technology is much cheaper and simpler than electron beam lithography and can be used for manufacturing SPR sensor structures [18, 19]. In previous studies, we have shown that IL with the use of chalcogenide photoresist is a promising technology for the formation of one- and two-dimensional submicron periodic structures on the surface of semiconductors and dielectrics [20].…”

Section: Methodsmentioning

confidence: 99%

Enhancing Surface Plasmon Resonance Detection Using Nanostructured Au Chips

et al. 2016

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The increase of the sensitivity of surface plasmon resonance (SPR) refractometers was studied experimentally by forming a periodic relief in the form of a grating with submicron period on the surface of the Au-coated chip. Periodic reliefs of different depths and spatial frequency were formed on the Au film surface using interference lithography and vacuum chalcogenide photoresists. Spatial frequencies of the grating were selected close to the conditions of Bragg reflection of plasmons for the working wavelength of the SPR refractometer and the used environment (solution of glycerol in water). It was found that the degree of refractometer sensitivity enhancement and the value of the interval of environment refractive index variation, Δn, in which this enhancement is observed, depend on the depth of the grating relief. By increasing the depth of relief from 13.5 ± 2 nm to 21.0 ± 2 nm, Δn decreased from 0.009 to 0.0031, whereas sensitivity increased from 110 deg./RIU (refractive index unit) for a standard chip up to 264 and 484 deg./RIU for the nanostructured chips, respectively. Finally, it was shown that the working range of the sensor can be adjusted to the refractive index of the studied environment by changing the spatial frequency of the grating, by modification of the chip surface or by rotation of the chip.

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Section: Methodsmentioning

confidence: 99%

Enhancing Surface Plasmon Resonance Detection Using Nanostructured Au Chips

et al. 2016

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“…Today, there are several techniques of forming a diffraction grating on the semiconductor substrate, namely, the laser-induced periodic surface structures [4], extreme ultraviolet lithography [5], electron beam lithography [6], ion beam lithography [7], nanoimprint technology [8], pulsed laser interference lithography [9], and laser interference lithography [10, 11]. The latter is well known and relatively cheap method that allows to form a planar periodicity on large areas.…”

Section: Introductionmentioning

confidence: 99%

Enhanced Dielectric Environment Sensitivity of Surface Plasmon-Polariton in the Surface-Barrier Heterostructures Based on Corrugated Thin Metal Films with Quasi-Anticorrelated Interfaces

et al. 2017

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A new approach to the formation of a 1D planar periodicity on the front of a plasmonic photodetector based on Schottky barrier is proposed. It allows forming a 1D planar periodicity with corrugation at the “metal/environment” interface by laser interference lithography using embedded chalcogenide wires, whereas the “metal/semiconductor” interface is flat that leads to reducing of surface recombination losses at Shottky barrier in contrary to the conventional technology for forming corrugated metal films on the semiconductor surface requiring chemical etching of the semiconductor substrate. In this case, the metal film interfaces are quasi-anticorrelated as opposed to correlated ones in the conventional technology. It has been theoretically predicted that the polarization sensitivity (T p/T s) strongly depends on the cross-sectional shape of chalcogenide wires and reaches a value of 8. Furthermore, it was theoretically found that the maximum sensitivity of the signal intensity on the environment refractive index is three times larger than for an equivalent structure obtained by conventional technology. Comparison of experimental data for the photocurrent in the case of two types of correlation between metal film interfaces demonstrates good agreement with numerical simulations.

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“…The substrate was then exposed to form periodic nanopore patterns in a square array by using laser interference lithography. [35][36][37] The interference lithography systems and processes used in this study were especially developed for the large-area (i.e., full wafer-scale) nanopatterning, as reported earlier. 12,[38][39][40][41][42][43] In this work, the nanopore patterns of two different periods (500 and 900 nm) were prepared by using a He-Cd laser of a wavelength of 325 nm (IK3501R-G, Kimmon Koha Co., Ltd.).…”

Section: Methodsmentioning

confidence: 99%