2013
DOI: 10.1116/1.4821655
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Fabrication of hierarchical nanostructures using free-standing trilayer membrane

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Cited by 12 publications
(17 citation statements)
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References 49 publications
(56 reference statements)
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“…One-step plasma etching can be used to fabricate hierarchical nanostructures; however, the feature size and period cannot be controlled precisely [ 108 , 109 ]. Using the tri-layer membrane as a stencil mask, we have also developed a new fabrication scheme of making large-area hierarchical nanostructures [ 110 ].…”
Section: Compliant Stencil Maskmentioning
confidence: 99%
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“…One-step plasma etching can be used to fabricate hierarchical nanostructures; however, the feature size and period cannot be controlled precisely [ 108 , 109 ]. Using the tri-layer membrane as a stencil mask, we have also developed a new fabrication scheme of making large-area hierarchical nanostructures [ 110 ].…”
Section: Compliant Stencil Maskmentioning
confidence: 99%
“…In order to create high aspect ratio nanoholes on the silicon microstructures, DRIE was directly applied through the nanopores of the tri-layer stencil mask. The SEM images of the high aspect ratio nanopillars featured on microtrenches and nanoholes on microgratings are shown in Figure 10 c,d, respectively [ 110 ].…”
Section: Compliant Stencil Maskmentioning
confidence: 99%
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“…Self-standing membranes with well-defined through-holes have wide applications such as microfiltration [1], gas exchange [2], stencil masks [3][4][5]. Self-standing membranes with well-defined through-holes have been fabricated by use of micro fabrication process based on silicon technology [6][7][8][9][10]. Membrane with very high aspect through-holes was also fabricated by anodic porous alumina [11].…”
Section: Introductionmentioning
confidence: 99%