Fabrication of high current density Nb integrated circuits using a self-aligned junction anodization process

Diffusion Stop-Layers for Superconducting Integrated Circuits and Qubits With Nb-Based Josephson Junctions

“…It is done differently in different technologies and in different labs. Most frequently, wet etching in acidic solutions is used [5], [20], [21]. Hydrogen contamination of Nb then occurs, as was observed in [5], with the typical concentration of the absorbed hydrogen of 1 to 2 atomic percent, similar to what we see after ion milling.…”

High-quality epitaxial NbN/AlN/NbN tunnel junctions with a wide range of current density

“…1 and Table I, the quality of our NbN/AlN/NbN junctions is not only better than that of all previously reported NbN tunnel junctions 9-12,15-17 but also comparable with or better than that of high-quality Nb tunnel junctions. [19][20][21] The controllability of J c is one of the important issues for junction applications. In this work, J c (i.e., the thickness of AlN barriers) is controlled by depositing time at a very low deposition rate of 0.05 nm/s.…”

FLUX-1 RSFQ microprocessor: Physical design and test results

“…In second iteration of Flux-1 this gate size increase was compensated by area savings due to dropping explicit drivers and receivers. This issue is addressed in our next generation J110E technology [10], which introduces higher resistance per square for shunts.…”