Nanosphere lithography is employed to simply fabricate metallic hexagonal nanohole array based on metal deposition within interstices of the nanospheres. In contrast, fabrication of nanodisc array (inverted pattern of nanohole array) unavoidably includes an additional step of creating a patterned resist layer or the use of high‐resolution lithography techniques. In this work, a facile method named “plasma‐etched nanosphere conductivity‐inverted lithography (PENCIL)” is developed to fabricate gold disc arrays on indium tin oxide (ITO)‐coated glass by simply incorporating plasma etching of nanosphere lithographic mask and electrodeposition of metal. The hexagonal close‐packed polystyrene (PS) spheres are served as mask for blocking an interaction of oxygen plasma and ITO surface. Topographic images and current mappings reveal different thicknesses and conductivities of plasma‐etched ITO surface. The exposed surface (gap area) exhibits higher resistivity compare with the area protected by spheres. As a result, site‐selective electrodeposition of gold is produced on patterned substrate. The microdiscs size, as well as the size and density of nanoparticles situated within the disc area can be tuned via etching and electrodeposition conditions. This suggests a simple, low‐cost, and high‐throughput technique, which potentially facilitate the expansive use of metal disc array in studying the structural dependent properties of nanomaterials.