2015
DOI: 10.1039/c4ra15907a
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Fabrication of glass-based microfluidic devices with dry film photoresists as pattern transfer masks for wet etching

Abstract: A simple, cheap and rapid method is developed to fabricate glass microfluidic devices with dry film photoresist as pattern transfer masks for wet etching, which provides an efficient approach for mass-production of glass microchips.

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Cited by 53 publications
(30 citation statements)
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“…Plastics are cheap, flexible, and easy to control, seemingly suitable for general purposes. However, their photolithography process is expensive and strong solvent materials cannot be used, which limits their applicability [37,38]. Silicon, on the other hand, exhibits good chemical and thermal compatibility, but it can be expensive, fragile, and opaque to visible and ultraviolet light, thus limiting its use in optical-based applications [38][39][40].…”
Section: Recent Trends In Microfluidic Device Fabricationmentioning
confidence: 99%
See 1 more Smart Citation
“…Plastics are cheap, flexible, and easy to control, seemingly suitable for general purposes. However, their photolithography process is expensive and strong solvent materials cannot be used, which limits their applicability [37,38]. Silicon, on the other hand, exhibits good chemical and thermal compatibility, but it can be expensive, fragile, and opaque to visible and ultraviolet light, thus limiting its use in optical-based applications [38][39][40].…”
Section: Recent Trends In Microfluidic Device Fabricationmentioning
confidence: 99%
“…However, their photolithography process is expensive and strong solvent materials cannot be used, which limits their applicability [37,38]. Silicon, on the other hand, exhibits good chemical and thermal compatibility, but it can be expensive, fragile, and opaque to visible and ultraviolet light, thus limiting its use in optical-based applications [38][39][40]. Although optical transparency, chemical inertness, rigidity, and high temperature resistance turn glass into a good material for microfluidics, it requires slow and high-cost deposition techniques [41], making it unsuitable for mass production.…”
Section: Recent Trends In Microfluidic Device Fabricationmentioning
confidence: 99%
“…Fabrication approaches are highly influenced by the type of material used to develop a device and the inherent properties of that material. Semiconductor materials like silicon-based devices can be fabricated using photolithography [97], which can further be used to fabricate polymeric devices using casting, injection molding [98], embossing, and imprinting techniques [99], while glass-based devices are produced by deep UV photolithography [100] and wet and dry etching methods [101]. With an increase in demand for disposable microfluidic devices in near-patient settings, cost-effective technologies, such as soft lithography, for developing polymeric micro and nano-chips have increased in the past two decades [102,103].…”
Section: Fabrication Techniquesmentioning
confidence: 99%
“…Copyright 2018, The Royal Society of Chemistry (RSC). (b) Reproduced with permission . Copyright 2015, RSC.…”
Section: Microfluidic Classification and Synthesis Of Colloidal Partimentioning
confidence: 99%
“…As early as the 1970s, glass or quartz tube microchannels have been used in the fields of gas chromatography and capillary electrophoresis, and these microscale analysis methods can be regarded as the prototype of microfluidics . With the development of micromachining technology in the semiconductor industry, the first generation of silicon/glass based microfluidic chips were constructed . Silicon based microfluidic devices have the advantages of resisting corrosion of organic solvent and good heat conduction.…”
Section: Microfluidic Classification and Synthesis Of Colloidal Partimentioning
confidence: 99%