Fabrication of Diverse Metallic Nanowire Arrays Based on Block Copolymer Self-Assembly

Jung, Yeon Sik; Lee, Ju Ho; Lee, Jun Young; Ross, Caroline A.

doi:10.1021/nl1023518

Cited by 104 publications

(99 citation statements)

References 25 publications

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“…Directed self-assembly of PS-b-PDMS on topographic patterns has been demonstrated in a number of articles [3,4,19,21,[32][33][34][35][36][37][38]. Further, Buriak et al has shown the effectiveness of microwave assisted method to guide cylinder-forming PS-b-PMMA and PS-b-P4VP BCPs on topographically patterned substrates [39].…”

Section: Directed Self-assembly By Microwave Irradiationmentioning

confidence: 99%

Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates

et al. 2015

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The integration of block copolymer (BCP) self-assembled nanopattern formation as an alternative lithographic tool for nanoelectronic device fabrication faces a number of challenges such as defect densities, feature size, pattern transfer, etc. Key barriers are the nanopattern process times and pattern formation on current substrate stack layers such as hard masks (e.g., silicon nitride, Si3N4). We report a rapid microwave assisted solvothermal (in toluene environments) self-assembly and directed self-assembly of a polystyrene-blockpolydimethylsiloxane (PS-b-PDMS) BCP thin films on planar and topographically patterned Si3N4 substrates. Hexagonally arranged, cylindrical structures were obtained and good pattern ordering was achieved. Factors affecting BCP self-assembly, notably anneal time and temperature, were studied and seen to have significant effects. Graphoepitaxy within the topographical structures provided long range, translational alignment of the patterns. The effect of surface topography feature size and spacing was investigated. The solvothermal microwave based technique used to provide periodic order in the BCP patterns showed significant promise and ordering was achieved in much shorter periods than more conventional thermal and solvent annealing methods. The implications of the work in terms of manufacturing technologies are discussed. OPEN ACCESSPolymers 2015, 7 593

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Section: Directed Self-assembly By Microwave Irradiationmentioning

confidence: 99%

Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates

et al. 2015

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“…Such multilayered superstructures can exhibit new functionalities not observed in conventional two-dimensional structures or thin films. For example, crossed magnetic nanowires can be endowed with stepwise magnetization behaviour because of different magnetization behaviour between the under and upper layers 61,62 . Such multilayered superstructures composed of sub-20 nm scale components may also have importance in the development of metamaterials operating in the ultravioletvisible regime 63,64 .…”

Section: Resultsmentioning

confidence: 99%

High-resolution nanotransfer printing applicable to diverse surfaces via interface-targeted adhesion switching

et al. 2014

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Nanotransfer printing technology offers outstanding simplicity and throughput in the fabrication of transistors, metamaterials, epidermal sensors and other emerging devices. Nevertheless, the development of a large-area sub-50 nm nanotransfer printing process has been hindered by fundamental reliability issues in the replication of high-resolution templates and in the release of generated nanostructures. Here we present a solvent-assisted nanotransfer printing technique based on high-fidelity replication of sub-20 nm patterns using a dual-functional bilayer polymer thin film. For uniform and fast release of nanostructures on diverse receiver surfaces, interface-specific adhesion control is realized by employing a polydimethylsiloxane gel pad as a solvent-emitting transfer medium, providing unusual printing capability even on biological surfaces such as human skin and fruit peels. Based on this principle, we also demonstrate reliable printing of high-density metallic nanostructures for non-destructive and rapid surface-enhanced Raman spectroscopy analyses and for hydrogen detection sensors with excellent responsiveness.

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“…In contrast, excellent work has been shown by Ross and co-workers using PS-b -PDMS templates and radio frequency sputtering of a variety of metals coupled with plasma etching. [86][87][88][89] PSb -PDMS is a BCP of major focus in the BCP nanopatterning community due to its high χ (χ ≈ 0.26) enabling small feature sizes and the PDMS block is a silicon containing backbone producing etch contrast when oxidized. After developing well-oriented oxidized PDMS linespace features following selective etching, radio frequency sputtering of Ti, W, Pt, Co, Ni, Ta, Au, and Al along with selective dry etching of the sputtered metal led to resulting metal wires with sub-10 nm feature size.…”

Section: Reviewmentioning

confidence: 99%

Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

et al. 2016

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Block copolymers (BCPs) and their directed self-assembly (DSA) has emerged as a realizable complementary tool to aid optical patterning of device elements for future integrated circuit advancements. Methods to enhance BCP etch contrast for DSA application and further potential applications of inorganic nanomaterial features (e.g., semiconductor, dielectric, metal and metal oxide) are examined. Strategies to modify, infiltrate and controllably deposit inorganic materials by utilizing neat self-assembled BCP thin films open a rich design space to fabricate functional features in the nanoscale regime. An understanding and overview on innovative ways for the selective inclusion/infiltration or deposition of inorganic moieties in microphase separated BCP nanopatterns is provided. Early initial inclusion methods in the field and exciting contemporary reports to further augment etch contrast in BCPs for pattern transfer application are described. Specifically, the use of evaporation and sputtering methods, atomic layer deposition, sequential infiltration synthesis, metal-salt inclusion and aqueous metal reduction methodologies forming isolated nanofeatures are highlighted in di-BCP systems. Functionalities and newly reported uses for electronic and non-electronic technologies based on the inherent properties of incorporated inorganic nanostructures using di-BCP templates are highlighted. We outline the potential for extension of incorporation methods to triblock copolymer features for more diverse applications. Challenges and emerging areas of interest for inorganic infiltration of BCPs are also discussed.

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Fabrication of Diverse Metallic Nanowire Arrays Based on Block Copolymer Self-Assembly

Cited by 104 publications

References 25 publications

Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates

Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates

High-resolution nanotransfer printing applicable to diverse surfaces via interface-targeted adhesion switching

Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

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