“…Several physical and chemical means have been utilized to modify three-dimensional fibrous networks, including evaporative coating [9,10], chemical vapor deposition [9], sol-gel processing [11], spin-on glass incorporation [9][10][11], as well as ozone, plasmavapor and ultraviolet photon exposure [12][13][14][15][16]. Vapor phase processes, including atmospheric pressure plasma exposure, are currently scaled to the rates required for high throughput processing, however, they often suffer from non-uniform surface modification due to line of sight and precursor delivery limitations, or low density of surface charge sites [17][18][19][20][21]. Atomic layer deposition represents a realistic alternative to these methods of nanoscale surface modifications.…”