1995
DOI: 10.1116/1.588267
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Fabrication of CdZnSe/ZnSe quantum dots and quantum wires by electron beam lithography and wet chemical etching

Abstract: Photoluminescence blueshift induced by reactive ion etching of strained CdZnSe/ZnSe quantum well structuresStresses and strains in lattice-mismatched stripes, quantum wires, quantum dots, and substrates in Si technology Fabrication of nanostructures in AlGaSb/InAs using electron-beam lithography and chemically assisted ion-beam etching J.

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Cited by 28 publications
(11 citation statements)
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References 11 publications
(13 reference statements)
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“…With the advent of advance fabrication techniques [1][2][3][4][5][6][7][8][9], however, it has become possible to develop such systems in laboratory. Electron beam lithography and wet chemical etching [9,10]are examples of such techniques, used to synthesize CdZnSe/ZnSe or InGaAs/GaAs hetero structures based one and two dimensional quantum systems.…”
Section: Introductionmentioning
confidence: 99%
“…With the advent of advance fabrication techniques [1][2][3][4][5][6][7][8][9], however, it has become possible to develop such systems in laboratory. Electron beam lithography and wet chemical etching [9,10]are examples of such techniques, used to synthesize CdZnSe/ZnSe or InGaAs/GaAs hetero structures based one and two dimensional quantum systems.…”
Section: Introductionmentioning
confidence: 99%
“…Since the early 90th when nano-structuring of semiconductor layers became possible [1,2,3] several investigations concerning the structural properties of these nano-structures were carried out [4,5,7,6]. The shadow mask technology for II-VI semiconductor layers opened the possibility to fabricate wire structures immediately during the growth [8].…”
Section: Introductionmentioning
confidence: 99%
“…Several techniques have been suggested for the fabrication of II-VI quantum well wires QWWs, most of them based on dry [1][2][3] or chemical [1,4] etching. Dry etched QWWs are characterized by high uniformity of their size but low photoluminescence (PL) efficiency.…”
Section: Introductionmentioning
confidence: 99%