Fabrication of carbon nanomembranes by helium ion beam lithography

Zhang, Xianghui; Vieker, Henning; Beyer, André; Gölzhäuser, Armin

doi:10.3762/bjnano.5.20

Cited by 24 publications

(23 citation statements)

References 34 publications

(42 reference statements)

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“…Thus, the use of FEBID and FIBID at room temperature presents limitations in speed or causes damage that hampers a broader use. In Figure 7, another example of a single-step resist-free charge-based nanolithography technique is included, that of the formation of ultra-thin carbon membranes from the exposure of self-assembled monolayers (SAM), which require at least 850 µC/cm 2 [75]. As shown in Figure 7, the use of Cryo-FEBID and Cryo-FIBID opens new opportunities due to the lower area charge dose required.…”

Section: Discussionmentioning

confidence: 99%

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

2019

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In this contribution, we compare the performance of Focused Electron Beam-induced Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature and under cryogenic conditions (the prefix "Cryo" is used here for cryogenic). Under cryogenic conditions, the precursor material condensates on the substrate, forming a layer that is several nm thick. Its subsequent exposure to a focused electron or ion beam and posterior heating to 50 • C reveals the deposit. Due to the extremely low charge dose required, Cryo-FEBID and Cryo-FIBID are found to excel in terms of growth rate, which is typically a few hundred/thousand times higher than room-temperature deposition. Cryo-FIBID using the W(CO) 6 precursor has demonstrated the growth of metallic deposits, with resistivity not far from the corresponding deposits grown at room temperature. This paves the way for its application in circuit edit and the fast and direct growth of micro/nano-electrical contacts with decreased ion damage. The last part of the contribution is dedicated to the comparison of these techniques with other charge-based lithography techniques in terms of the charge dose required and process complexity. The comparison indicates that Cryo-FIBID is very competitive and shows great potential for future lithography developments.

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Section: Discussionmentioning

confidence: 99%

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

2019

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“…ions than for electrons. Zhang et al attribute this to a higher SE yield and an SE energy distribution that is shifted to lower energies [60]. More experimental evidence is needed to determine whether this is indeed correct.…”

Section: Comparison To Ion Beam Lithographymentioning

confidence: 83%

“…For He ? ions, the higher deposition yield (compared to deposition with electrons) is possibly due to a higher SE yield [60]. When cross-linking self-assembled monolayers, the dose to fully cross-link the layer is about 609 lower for He ?…”

Section: Comparison To Ion Beam Lithographymentioning

confidence: 99%

Sub-10 nm writing: focused electron beam-induced deposition in perspective

Dorp

2014

Appl. Phys. A

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Over the past decade, focused electron beaminduced deposition has become a mature necessary part of the tool box engineers and scientists. This review presents the current state of the art in sub-10 nm focused electron beam deposition and describes the dominant mechanisms that have been found so far for this regime. Several questions regarding patterning at the highest resolution are addressed. What do our findings mean for using sub-10 nm focused electron beam deposition for industrial applications? And which fundamental issues remain to be solved? The overview shows that low-energy secondary electrons dominate the deposition process. As a result, the highest obtainable spatial resolution (averaged over many deposits) is limited by the mean free path of those electrons. Therefore, the only route to improve the resolution beyond the current appears to be using complexes that are sensitive to the high-energy electrons in the incident beam, rather than to the secondaries. Focused electron beam-induced deposition is compared to related techniques. It is on par with resist-based sub-10 nm electron beam lithography, showing similar spatial resolutions at similar electron doses. Regarding ion beam lithography, there are several distinguishing issues. Sub-10 nm writing has yet to be demonstrated for ion deposition, and although the deposition rate is relatively low when writing with electrons, electrons do not induce damage to the sample. The latter is a crucial advantage for focused electron beam-induced deposition. Finally, the main challenges regarding the applicability of sub-10 nm focused electron beam-induced deposition are discussed.

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“…a, (ii)). It has been demonstrated that crosslinking of aromatic SAMs can also be achieved via He + ion and UV/extreme UV irradiation as well as electron irradiation with significantly higher in the range of keV electron energies . However, low energy electrons generated during these different types of irradiation were identified as the main reason for the observed modification.…”

Section: Conversion Of Aromatic Sams Into Cnmsmentioning

confidence: 99%

Graphene Growth by Conversion of Aromatic Self‐Assembled Monolayers

Turchanin

2017

Annalen der Physik

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Despite present diversity of graphene production methods there is still a high demand for improvement of the existing production schemes or development of new. Here a method is reviewed to produce graphene employing aromatic self-assembled monolayers (SAMs) as molecular precursors. This method is based on electron irradiation induced crosslinking of aromatic SAMs resulting in their conversion into carbon nanomembranes (CNMs) with high thermal stability and subsequent pyrolysis of CNMs into graphene in vacuum or in the inert atmosphere. Depending on the production conditions, such as chemical structure of molecular precursors, irradiation and annealing parameters, various properties of the produced graphene sheets including shape, crystallinity, thickness, optical properties and electric transport can be adjusted. The assembly of CNM/graphene van der Waals heterostructures opens a flexible route to non-destructive chemical functionalization of graphene for a variety of applications in electronic and photonic devices.

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Fabrication of carbon nanomembranes by helium ion beam lithography

Cited by 24 publications

References 34 publications

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

Sub-10 nm writing: focused electron beam-induced deposition in perspective

Graphene Growth by Conversion of Aromatic Self‐Assembled Monolayers

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