Fabrication of beam homogenizers in quartz by laser micromachining

Kopitkovas, G.; Lippert, Thomas; Dávid, Christian; Canulescu, Stela; Wokaun, Alexander; Gobrecht, J.

doi:10.1016/j.jphotochem.2004.05.001

Cited by 51 publications

(40 citation statements)

References 21 publications

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“…The first one is that the fluence -etch rate graphs can be fitted by two straight lines. This behavior was observed by many research groups [13][14][27][28][29][30][31][32], but correct, coherent explanation have not existed yet. We have already presented a LIBWE model in our previous papers [15,27], which gave relatively good results for LIBWE applying ArF laser (nevertheless the calculated threshold fluence was higher than the measured one), but this model did not work for KrF experiments, namely etching was not predicted in the applied fluence range (up to ≈2 J/cm 2 ).…”

Section: Introductionmentioning

confidence: 81%

“…The thin layer could be easily removed by ultrasonic bath in acetone or by wiping the surface with acetone soaked paper wadding. This layer was characterized by Raman spectroscopy and it was found that this layer contains mostly amorphous carbon particles [32][33][34]. The detailed description of this layer can be found in Rico Böhme's PhD thesis [35].…”

Section: Etching: Particle Deposition -Qualitative Observationmentioning

confidence: 99%

“…The correct determination of the optical properties (absorption, refractive index) of this layer consisting of carbon particles is difficult, because it scatters the light, which strongly influences the results. These carbon particles can originate from the decomposition of the organic molecules by the ultraviolet photons, and probably can contaminate the surface of the etched fused silica [32][33][34][35]. Although this contamination may have significant effect on the etching procedure, it was observed only on those areas where the local laser fluence value was just below the etching threshold.…”

Section: Etching: Particle Deposition -Qualitative Observationmentioning

confidence: 99%

“…Generally we state from these measurements that besides the slightly bonded deposited graphite-like layer [32][33][34][35] …”

Section: Ellipsometrymentioning

confidence: 99%

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Interpretation and Modeling of Laser-Induced Backside Wet Etching Procedure

Vass

Budai

Schay

et al. 2010

JLMN

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Laser-induced backside wet etched fused silica surfaces were characterized by X-ray photoelectron spectroscopy (XPS) and ellipsomerty, and a new numerical model was developed to interpret the etching procedure on the basis of our recent results. ArF and KrF lasers were used for etching, while the applied liquid absorbers were naphthalene/methyl-methacrylate and pyrene/acetone solutions. The XPS measurements showed that the completely cleaned, etched fused silica surface layers were contaminated by carbon (which originated from the organic absorber molecules). The optical parameters of the modified layers were measured by spectroscopic ellipsometer. The thicknesses of these carbon contaminated layers were very thin (between 10 and 30 nm), while their absorption coefficient and the refractive index at 248 nm were between 100 000 and 180 000 cm -1 , and 1.85, respectively. Our previous numerical model was completed on the basis of the determined properties of this modified layer, and our results proved that this layer plays key role in the etching procedure.

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Section: Introductionmentioning

confidence: 81%

Section: Etching: Particle Deposition -Qualitative Observationmentioning

confidence: 99%

Section: Etching: Particle Deposition -Qualitative Observationmentioning

confidence: 99%

“…Generally we state from these measurements that besides the slightly bonded deposited graphite-like layer [32][33][34][35] …”

Section: Ellipsometrymentioning

confidence: 99%

See 2 more Smart Citations

Interpretation and Modeling of Laser-Induced Backside Wet Etching Procedure

Vass

Budai

Schay

et al. 2010

JLMN

View full text Add to dashboard Cite

show abstract

“…They are required for developing micro-fluidic devices such as reactors, mixers, ejectors, cell selectors, and others [11][12][13][14]. The patterning is also required for developing optical micro-components such as lens and prism arrays, and others [15][16][17][18][19]. However, fabrications of things with complicated shapes of these sizes are considerably difficult by mechanical cutting or electro discharge machining.…”

Section: Introductionmentioning

confidence: 99%

Improvement of Patterning Homogeneity in a Field of Projection Exposure System Using a Gradient-Index Lens Array

Horiuchi

Sato

Kobayashi

2017

J. Photopol. Sci. Technol.

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Pattern width homogeneity in an exposure field of gradient-index (GRIN) lens array was greatly improved by changing the sub-scan method for averaging the pattern widths. By investigating the pattern width distribution in the exposure field, it was clarified that the parts, where the printed patterns were degraded and pattern widths were notably changed, appeared as striped lines. It was supposed that the striped abnormal pattern-width change was caused by the extra exposures for the times when the sub-scan stage was stopped at both the sub-scan ends for turning the scan direction. For this reason, sub-scan length was vastly extended, and the sub-scan stage was turned at the both ends after all the patterns on a reticle passed over the actually used parts of a GRIN lens array. By this method, no patterns were exposed and projected on a wafer while the sub-scan stage was stopped for turning at the both ends. As a result, 15-µm L&S patterns were almost homogeneously printed in the exposure field within a variation range of ±6%.

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The Second Laser Revolution in Chemistry: Emerging Laser Technologies for Precise Fabrication of Multifunctional Nanomaterials and Nanostructures

Manshina,

Tumkin,

Khairullina

et al. 2024

Adv Funct Materials

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The use of photons to directly or indirectly drive chemical reactions has revolutionized the field of nanomaterial synthesis resulting in appearance of new sustainable laser chemistry methods for manufacturing of micro‐ and nanostructures. The incident laser radiation triggers a complex interplay between the chemical and physical processes at the interface between the solid surface and the liquid or gas environment. In such a multi‐parameter system, the precise control over the resulting nanostructures is not possible without deep understanding of both environment‐affected chemical and physical processes. The present review intends to provide detailed systematization of these processes surveying both well‐established and emerging laser technologies for production of advanced nanostructures and nanomaterials. Both gases and liquids are considered as potential reacting environments affecting the fabrication process, while subtractive and additive manufacturing methods are analyzed. Finally, the prospects and emerging applications of such technologies are discussed.

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Fabrication of beam homogenizers in quartz by laser micromachining

Cited by 51 publications

References 21 publications

Interpretation and Modeling of Laser-Induced Backside Wet Etching Procedure

Interpretation and Modeling of Laser-Induced Backside Wet Etching Procedure

Improvement of Patterning Homogeneity in a Field of Projection Exposure System Using a Gradient-Index Lens Array

The Second Laser Revolution in Chemistry: Emerging Laser Technologies for Precise Fabrication of Multifunctional Nanomaterials and Nanostructures

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