Fabrication of a low resistivity tantalum nitride thin film

Shen, Hong; Ramanathan, Ravi

doi:10.1016/j.mee.2005.08.006

Cited by 20 publications

(11 citation statements)

References 12 publications

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“…This implies that the dominant phase of metallic Sn could be controlled by N 2 gas ratio. The crystal sizes of metallic Sn were deduced from the Sn(101), (200), (220) and (211) peaks using the Debye-Scherrer's equation [20] and are listed in Table 1. Based on these determined values, the crystal size decreased with increasing N 2 gas ratio.…”

Section: Resultsmentioning

confidence: 99%

Tin nitride thin films fabricated by reactive radio frequency magnetron sputtering at various nitrogen gas ratios

Choi¹,

Kang²,

Park³

et al. 2014

Thin Solid Films

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Section: Resultsmentioning

confidence: 99%

Tin nitride thin films fabricated by reactive radio frequency magnetron sputtering at various nitrogen gas ratios

Choi¹,

Kang²,

Park³

et al. 2014

Thin Solid Films

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“…However, due to the effect of magnetic atoms, which may be present in the materials, and phonon on the electrical carriers, holes or electrons, it is hard to obtain materials that have constant resistivity in a specific narrow range of temperature used, not to mention for a wide temperature range. Hence, many efforts have been made in lowering the TCR by either controlling the manufacturing processes of materials [1][2][3][4][5][6] or using composite materials. 7 Attempts to explain the low TCR for metallic materials include mechanisms such as based on a mixture effect of surface oxide and inner metallic phase, 8 the effect of K-state associated with the formation of short-range order, 9 or the s-d scattering in transition metals.…”

confidence: 99%

Near-constant resistivity in 4.2-360 K in a B2 Al2.08CoCrFeNi

Chen

Kao

2012

AIP Advances

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Near-constant electrical resistivity over 4.2 to 360 K in a pseudo-B2 Al2.08CoCrFeNi is reported. Absolute values of coefficients in electrical resistivity equation as a function of temperature, ρ(T) = ρ0 + Aln(T) + BT2 + CT3 + DT, decrease as temperature rises, manifesting that they gradually become less while temperature increases. Overall average temperature coefficient of resistivity (TCR) in 4.2 to 360 K is 72 ppm/K, with a half-parabolic shape in its resistivity-temperature curve that is similar to Manganin. It shows that the phonon effect on this alloy keeps nearly the same through this temperature range

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“…The X-ray diffractograms of the layers deposited on Si and metallic substrates are shown in Figure 2. The diffractogram shows peaks corresponding to hexagonal ε-TaN and one to the metallic cubic Ta phase [9,[19][20][21][22][23][24][25][26]. The preferred orientation for ε-TaN is (110) for both substrates; for the Si substrate there is a peak corresponding to direction (300).…”

Section: Characterization Of Films (Sem Xrd Raman and Corrosion Stmentioning

confidence: 99%

Tribological, Tribocorrosion and Wear Mechanism Studies of TaZrN Coatings Deposited by Magnetron Sputtering on TiAlV Alloy

et al. 2018

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Different works have demonstrated that tantalum, zirconium, and their nitrides present good biocompatibility. Additionally, TaN and ZrN possess excellent corrosion and wear resistance. Ternary nitrides such as TiAlN have been improved in terms of their mechanical properties with respect to binary systems. Therefore, ternary nitrides as TaZrN have high potential to be used in biomedical applications. This work was focused on studying the tribological and tribocorrosion performance of a TaZrN film. The coating was deposited by DC (Direct Current) magnetron sputtering in a reactive atmosphere using Ta and Zr targets. The tribological characterization was carried out in dry (atmospheric condition) and corrosive environments (synthetic body fluid). The coated surface shows better wear resistance than the uncoated in both conditions. The wear mechanism was studied by FE-SEM (Field Emission-Scanning Electron Microscopy) and Raman confocal microscopy. The wear rate of the coated surfaces was higher in corrosive ambient than in dry conditions. The observed wear mechanism was adhesive–abrasive for lower loads and abrasive at dry conditions for an applied load of 2 N. For corrosive media the principal wear mechanism for 2 N was abrasive–corrosive. For all tests at dry conditions, the formation of a tribolayer of metal oxides, graphite, and amorphous carbon was seen.

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Fabrication of a low resistivity tantalum nitride thin film

Cited by 20 publications

References 12 publications

Tin nitride thin films fabricated by reactive radio frequency magnetron sputtering at various nitrogen gas ratios

Tin nitride thin films fabricated by reactive radio frequency magnetron sputtering at various nitrogen gas ratios

Near-constant resistivity in 4.2-360 K in a B2 Al2.08CoCrFeNi

Tribological, Tribocorrosion and Wear Mechanism Studies of TaZrN Coatings Deposited by Magnetron Sputtering on TiAlV Alloy

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