2014
DOI: 10.1063/1.4903165
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Fabrication of 5-20 nm thick β-W films

Abstract: A technique to fabricate 5 to 20 nm thick sputter deposited β W films on SiO2 and Si substrates is presented. This is achieved by growing tungsten on a 5 nm SiO2 layer or in an oxygen controlled environment by flowing 2 sccm of O2 during deposition. Resistivity, X-ray photoelectron spectroscopy, X-ray diffraction and reflectivity studies were performed to determine the phase and thickness of tungsten films. These results demonstrate a technique to grow this film on bare Si or a SiO2 substrate, which can enable… Show more

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Cited by 22 publications
(9 citation statements)
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“…Our materials' characterization shows that the incorporation of oxygen stabilizes the β−W. This is consistent with previous studies, which have shown that the formation of β−W is extremely sensitive to the oxygen incorporation during the growth process 37 38 39 40 41 , and an oxygen concentration of only 10% is sufficient to stabilize β−W. In our experiments, at n =12.1%, we obtain a SHA of , which is higher than any previous measurements in conventional metal-based systems.…”
Section: Discussionsupporting
confidence: 92%
“…Our materials' characterization shows that the incorporation of oxygen stabilizes the β−W. This is consistent with previous studies, which have shown that the formation of β−W is extremely sensitive to the oxygen incorporation during the growth process 37 38 39 40 41 , and an oxygen concentration of only 10% is sufficient to stabilize β−W. In our experiments, at n =12.1%, we obtain a SHA of , which is higher than any previous measurements in conventional metal-based systems.…”
Section: Discussionsupporting
confidence: 92%
“…2(a) (purple curve), strongly limiting the use of seed and adhesion materials. However, there are reports showing that the presence of oxygen or nitrogen adsorbed onto the surface provides nucleation sites for the growth of metastable β-W [37][38][39].…”
Section: Extension Of Tungsten β Phase Windowmentioning
confidence: 99%
“…Such thin layers impose severe constraints on the choice of thickness and on the etching conditions, possibly leading to a strong distribution of the SOT resistance and efficiency from device to device. We report in this paper the possibility of optimizing the growth of β-W using dopants such as nitrogen and oxygen [37][38][39]. We develop a process in which growing a bilayer of oxygen-and nitrogendoped tungsten, W(O, N), results in process control of the tungsten β phase to more than 10 nm, while concurrently improving the PMA as well as improving the SOT efficiency to −44.4%.…”
Section: Introductionmentioning
confidence: 99%
“…In many of the prior studies of W deposition, the formation of -W phase was achieved by deliberately introducing oxygen into the chamber (see, for example, Ref. 35) when was the desired phase, or was the unwanted consequence of the presence of residual oxygen impurities in the chamber when ↵ was the desired phase (see, for example, Ref. 6).…”
Section: ( C/min)mentioning
confidence: 99%