2018
DOI: 10.3390/mi9100528
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Fabrication and Optimization of High Aspect Ratio Through-Silicon-Vias Electroplating for 3D Inductor

Abstract: In this study, the filling process of high aspect ratio through-silicon-vias (TSVs) under dense conditions using the electroplating method was efficiently achieved and optimized. Pulsed power was used as the experimental power source and the electroplating solution was prepared with various additive concentrations. Designed control variable experiments were conducted to determine the optimized method. In the control variable experiments, the relationship of multiple experimental variables, including current de… Show more

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Cited by 16 publications
(13 citation statements)
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“…Hollow Cu TSVs 45,163 , magnetic self-assembly for TSV fabrication 164 , void-free high-AR TSV filling 165,166 , magnetic core integration 59,106,163 .…”
Section: Powermentioning
confidence: 99%
“…Hollow Cu TSVs 45,163 , magnetic self-assembly for TSV fabrication 164 , void-free high-AR TSV filling 165,166 , magnetic core integration 59,106,163 .…”
Section: Powermentioning
confidence: 99%
“…Through-silicon via (TSV) is a key structure of 3D integrated circuits (IC) [1][2][3][4][5]. TSVbased 3D ICs have a shorter interconnect length, higher integration density, faster data communication, and lower power consumption [6][7][8][9][10]. Due to the excellent anti-noise characteristic during the transmission of different signals, shielded differential throughsilicon vias (SDTSV) have wide prospects in 3D ICs [11].…”
Section: Introductionmentioning
confidence: 99%
“…To extend research on micromotor coils with magnetic materials, we focus on high aspect ratio 3D solenoid coils with silicon steel cores. In a previous study, we investigated the electroplating process of high aspect ratio through silicon vias (TSVs) and then fabricated both air-core and iron-core 3D solenoid MEMS coils [23], [24].…”
Section: Introductionmentioning
confidence: 99%