Fabrication and in situ magnetoresistance measurement of a Ni point-contact in planar configuration

Ohsawa, Yoshiaki

doi:10.1016/j.jmmm.2004.10.081

Cited by 8 publications

(2 citation statements)

References 5 publications

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“…A report of an MR of 18 per cent in a similar 35 nm device was published recently [392]. Ni nanocontacts were prepared by Ohsawa using a combination of FIB patterning followed by ion milling combined with in situ magnetoresistance measurements [393]. The sample was observed by TEM after milling.…”

Section: Experimental Explorationmentioning

confidence: 99%

Spin-polarised currents and magnetic domain walls

Marrows

2005

Advances in Physics

216

163

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Electrical currents flowing in ferromagnetic materials are spinpolarised as a result of the spin-dependent band structure. When the spatial direction of the polarisation changes, in a domain structure, the electrons must somehow accommodate the necessary change in direction of their spin angular momentum as they pass through the wall. Reflection, scattering, and a transfer of angular momentum to the lattice are all possible outcomes, depending on the circumstances. This gives rise to a variety of different physical effects, most importantly a contribution to the electrical resistance caused by the wall, and a motion of the wall driven by the spin-polarised current.Historical and recent research on these topics is reviewed. * Phone: +44(0)113 3433780

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Section: Experimental Explorationmentioning

confidence: 99%

Spin-polarised currents and magnetic domain walls

Marrows

2005

Advances in Physics

216

163

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“…In one approach prestructured samples are fine-tuned via conventional nonspatially resolving Ar ion milling and MR investigations are performed in the same vacuum system. 15 In a second approach, 16 the sample is transferred under vacuum from a low energy ion milling stage to the measurement stage. Both methods are good but time consuming when systematic studies require frequent sample exchange.…”

Section: Introductionmentioning

confidence: 99%

Integrated setup for the fabrication and measurement of magnetoresistive nanoconstrictions in ultrahigh vacuum

Stickler

Frömter

et al. 2008

Review of Scientific Instruments

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A UHV instrument is presented for in situ fabrication of nanostructures and in situ investigation of their magnetoresistance. Nanostructures of diverse shape and size are created from thin films utilizing a focused ion beam. The magnetic nanostructures are contacted via a micromanipulator, which makes it possible to address the individual structures. The system is additionally equipped with a scanning electron microscope column, which is used for damage-free navigation and control of the structuring and contacting. First magnetoresistance measurements of structures carved into a Permalloy film demonstrate the high sensitivity and the flexibility of the new setup.

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Magnetoresistance of nickel nanocontacts fabricated by different methods

Wei

Wang

Clifford

et al. 2006

Journal of Applied Physics

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Nickel nanocontacts have been fabricated by focused ion-beam ͑FIB͒ milling of e-beam patterned planar contacts, FIB milling of conical-shaped nanoperforations in a silicon nitride membrane, and nanoimprinting using an atomic force microscope. Their sizes ranged from 1 to 30 nm. Magnetoresistance of up to 3% is developed in a field of a few millitesla. This is interpreted in terms of ballistic magnetoresistance across a wide domain wall whose structure is determined by dipolar interactions at the contact.

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Fabrication and in situ magnetoresistance measurement of a Ni point-contact in planar configuration

Cited by 8 publications

References 5 publications

Spin-polarised currents and magnetic domain walls

Spin-polarised currents and magnetic domain walls

Integrated setup for the fabrication and measurement of magnetoresistive nanoconstrictions in ultrahigh vacuum

Magnetoresistance of nickel nanocontacts fabricated by different methods

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