2010
DOI: 10.1364/oe.18.002940
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Fabrication and characterization of subwavelength nanostructures on freestanding GaN slab

Abstract: We develop a novel way to fabricate subwavelength nanostructures on the freestanding GaN slab using a GaN-on-silicon system by combining self-assemble technique and backside thinning method. Silicon substrate beneath the GaN slab is removed by bulk silicon micromachining, generating the freestanding GaN slab and eliminating silicon absorption of the emitted light. Fast atom beam (FAB) etching is conducted to thin the freestanding GaN slab from the backside, reducing the number of confined modes inside the GaN … Show more

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Cited by 11 publications
(8 citation statements)
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“…Such freestanding metamaterials can be experimentally realized by using undercutting techniques [40], [41]. They are arranged on a square lattice with 350-nm period.…”
Section: Resultsmentioning
confidence: 99%
“…Such freestanding metamaterials can be experimentally realized by using undercutting techniques [40], [41]. They are arranged on a square lattice with 350-nm period.…”
Section: Resultsmentioning
confidence: 99%
“…The fabrication process, described in detail elsewhere [17-19], is schematically illustrated in Figure 1. Nanoscale gratings are patterned in ZEP520A resist using EB lithography, and the resist structures act as a mask for FAB etching of GaN (steps a-b).…”
Section: Fabricationmentioning
confidence: 99%
“…In our previous work, totally freestanding GaN microstructures were generated by a combination of fast atom beam (FAB) etching of GaN and deep reactive ion etching (DRIE) of silicon [11,12]. With Cl 2 gas as the process gas, FAB etching can effectively manufacture GaN to get nanometer scale features.…”
Section: Rie Of Gan and Frontside Dry-release Of Silicon Suspendedmentioning
confidence: 99%