2019
DOI: 10.3906/fiz-1905-16
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Fabrication and characterization of Si-PIN photodiodes

Abstract: In this work, characteristics of silicon-based p + type, intrinsic (I), n − type (Si-PIN) photodiodes with active area of 3.5 × 3.5 mm 2 , 5.0 × 5.0 mm 2 , or 7.0 × 7.0 mm 2 and their possible usage in optoelectronics were studied. The devices were fabricated in the Radiation Detector Application and Research Center (NÜRDAM) of Bolu Abant İzzet Baysal University, Turkey. To acquire the device specifications, the current-voltage (I-V) and the capacitance-voltage (C-V) measurements were carried out in the photoc… Show more

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Cited by 5 publications
(2 citation statements)
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“…In 2019, Emre Doganci et al 43 . Examined the characteristics of silicon normalp+inormaln photodiodes with 3.5×3.5, 5.0×5.0, or 7.0×7.0 mm2 active area.…”
Section: Laser Beam Detection Based On Pn Photodiodesmentioning
confidence: 99%
See 1 more Smart Citation
“…In 2019, Emre Doganci et al 43 . Examined the characteristics of silicon normalp+inormaln photodiodes with 3.5×3.5, 5.0×5.0, or 7.0×7.0 mm2 active area.…”
Section: Laser Beam Detection Based On Pn Photodiodesmentioning
confidence: 99%
“…At the same time, action is needed to ensure the improvement of the surface properties to reduce the surface recombination velocity and the simultaneous use of anti-reflection coatings. 42 In 2019, Emre Doganci et al 43 Examined the characteristics of silicon p þ − i − n − photodiodes with 3.5 × 3.5, 5.0 × 5.0, or 7.0 × 7.0 mm 2 active area. Voltage-current (V-I) and capacitor-voltage (C-V) measurements were performed in the photoconductive (PC) mode to achieve the device characterizations.…”
Section: Laser Beam Detection Based On Pn Photodiodesmentioning
confidence: 99%