Fabrication and characterization of NiO thin films prepared by SILAR method

Akaltun, Yunus; Çayir, Tuba

doi:10.1016/j.jallcom.2014.10.194

Cited by 81 publications

(25 citation statements)

References 33 publications

(37 reference statements)

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“…These E g values are in good agreement with the values reported in [4,7,8,13] for NiO thin films. The decrease of E g with annealing temperature may be attributed to the increase of crystallite size and decrease of defect sites concentration [13,14]. …”

Section: Resultssupporting

confidence: 91%

Nanocrystalline Nickel Oxide (NiO) Thin Films Grown on Quartz Substrates: Influence Of Annealing Temperatures

2017

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In the present investigation, nanocrystalline NiO thin films were prepared by thermal oxidation annealing of DC magnetron sputtered Ni thin films on quartz substrates. The effect of annealing temperature on the films structural, morphological and optical properties was investigated. The XRD analysis shows that all prepared films were of NiO with cubic structure and (200) orientation. The thickness of NiO films was in range of 40-100 nm. The average crystallite size is found to increase from 16 to 36 nm and the optical band gap energy decreases from 3.62 to 3.38 eV by increasing the annealing temperature from 400• C to 600• C. The AFM and SEM results show that the annealing temperature effectively influences the surface morphology of the films.

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Section: Resultssupporting

confidence: 91%

Nanocrystalline Nickel Oxide (NiO) Thin Films Grown on Quartz Substrates: Influence Of Annealing Temperatures

2017

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“…These values are given in Table 1. The large size of the grains and the small value of the dislocation density is an indication of good crystallization [43].…”

Section: Crystal Structure Parameters Calculationsmentioning

confidence: 99%

Fabrication of temperature sensor based on copper oxide nanowires grown on titanium coated glass substrate

Aljubouri

Faisal

Khalef

2018

Materials Science-Poland

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Single phase, adherent films of copper oxide nanowires (CuO NWs) were successfully grown on a glass substrate. Titanium nanofilm was pre-coated on the glass substrate to assist the growth of a layer adherent to the substrate. The copper film of 1.5 μm thickness was deposited via physical vapor deposition technique followed by thermal oxidation in air at various temperatures for 4 h. The product was characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), ultraviolet-visible (UV-Vis) and Fourier transformation infrared (FT-IR) spectroscopy to find the crystal structure, morphology, phases, and optical properties of the deposited films. The CuO NWs film with 60% transmittance at wavelengths greater than 800 nm was obtained. It can be used as an infrared thermal imaging filter and in optoelectronic devices. The fabricated temperature sensor exhibited high sensitivity in the temperature range of 20 °C to 180 °C.

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“…Bu yöntemler arasında SILAR nispeten basit, çevre dostu, güvenli, düşük sıcaklık uyumlu ve uygun maliyetli olduğu için umut verici bir tekniktir [14,15].…”

Section: Introductionunclassified

Farklı Oranlarda Tiyoüre Katkısının Nanoyapılı Kadmiyum Oksit (CdO) Filmlerin Fiziksel Özellikleri Üzerine Etkisinin İncelenmesi

Aydın¹,

Şahin²

2017

SDÜ Fen Bil Enst Der

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Özet: Bu çalışmanın amacı nanoyapılı CdO filmlerin fiziksel özelliklerine tiyoüre konsantrasyonunun etkisini incelemektir. Bunun için farklı tiyoüre konsantrasyonlarındaki (%0, 0.5, 1 ve 2) dört seri CdO film soda lime cam altlık üzerine SILAR tekniği kullanılarak büyütüldü. Bu filmlerin morfolojileri, kristal yapıları ve optik özellikleri sırasıyla MM, XRD ve UV-visible spektroskopi teknikleri ile karakterize edilmiştir. MM görüntüleri tiyoüre konsantrasyonunun nanoyapılı CdO filmlerin yüzey morfolojilerini etkilediğini göstermektedir. CdO filmlerinin düzlemlerinin tercihli yöneliminin tiyoüre konsantrasyon değerine kuvvetle bağlı olduğunu XRD analizinden elde edilen sonuçlar ortaya koymaktadır. UV-vis analizinden, tiyoüre miktarı arttıkça CdO filmlerinin optik enerji bant aralığının (Eg) önce azaldığı ve daha sonra tekrar artan konsantrasyonla arttığı belirlenmiş ve bu enerji değerlerinin (2.25 -2.13) eV aralığında olduğu bulunmuştur. Investigation of Effect of Thiourea Addition in Different Rates on the Physical Properties of Nanostructured Cadmium Oxide (CdO) FilmsKeywords Cadmium Oxide (CdO), Thiourea, SILAR, SurfactantAbstract: The purpose of this study is to investigate the influence of thiourea concentration on physical properties of the nanostructured CdO films. Four series CdO films were deposited on soda lime glass substrate by using SILAR technique at different Thiourea concentrations of 0, 0.5, 1 and 2%. The morphologies, crystal structures and optical properties of these films have been characterized using MM, XRD, and UV-visible spectroscopy. From the MM images showed that thiourea concentration influence the morphologies of the nanostructures. The results obtained from XRD analysis showed that the growth preferred orientation of the CdO films strongly depend on thiourea concentrations value. From UV-vis analysis it was found that the optical energy band gap (Eg) of the CdO films changes with the amount of thiourea and it was in the range of (2.25 -2.13) eV.

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Fabrication and characterization of NiO thin films prepared by SILAR method

Cited by 81 publications

References 33 publications

Nanocrystalline Nickel Oxide (NiO) Thin Films Grown on Quartz Substrates: Influence Of Annealing Temperatures

Nanocrystalline Nickel Oxide (NiO) Thin Films Grown on Quartz Substrates: Influence Of Annealing Temperatures

Fabrication of temperature sensor based on copper oxide nanowires grown on titanium coated glass substrate

Farklı Oranlarda Tiyoüre Katkısının Nanoyapılı Kadmiyum Oksit (CdO) Filmlerin Fiziksel Özellikleri Üzerine Etkisinin İncelenmesi

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