In this work, we compare pyrolyzed carbon derived from the photoresist SU‐8 alone or in combination with polystyrene and poly(styrene)‐block‐poly(dimethylsiloxane) copolymer (PS‐b‐PDMS), to be used as novel materials for micro‐ and nanoelectrodes. The pyrolyzed carbon films are evaluated with scanning electron microscopy, thermal gravimetric analysis, X‐ray photoelectron spectroscopy, contact angle analysis, and Raman spectroscopy. Furthermore, the standard rate constant for electron transfer is determined from cyclic voltammograms and found to be lower for PS‐b‐PDMS compared to PS and SU‐8 films. This may be related to the lower carbon content of PS‐b‐PDMS, as well as to its higher microstructural disorder.