2004
DOI: 10.1088/0268-1242/19/7/013
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Fabrication and characterization of circular geometry InP/InGaAs double heterojunction bipolar transistors

Abstract: An MOCVD-grown circular geometry InP/InGaAs double heterojunction bipolar transistor utilizing a novel δ + -layer composite collector structure was fabricated. A breakdown voltage of 12 V and an offset voltage of just 100 mV were achieved and high injection current densities over 3.2 × 10 5 A cm −2 , which suggest no significant current blocking related to the wide bandgap InP collector layers. A cut-off frequency of 42 GHz was measured at a collector current density of 1.1 × 10 6 A cm −2 .

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Cited by 2 publications
(2 citation statements)
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References 20 publications
(17 reference statements)
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“…The discontinuity in valance for the FSF/emitter interface prevents the holes from moving further up to the front contact while allowing the flow of electrons 74 . The band alignment of In 0.53 Ga 0.47 As structure was investigated in several studies 87 , 88 . The n-InP will form a barrier to holes, but a sink for electrons at the FSF and visa verse at the BSF/buffer.…”
Section: Resultsmentioning
confidence: 99%
“…The discontinuity in valance for the FSF/emitter interface prevents the holes from moving further up to the front contact while allowing the flow of electrons 74 . The band alignment of In 0.53 Ga 0.47 As structure was investigated in several studies 87 , 88 . The n-InP will form a barrier to holes, but a sink for electrons at the FSF and visa verse at the BSF/buffer.…”
Section: Resultsmentioning
confidence: 99%
“…Belghachi et al 82 for the FSF/emitter interface prevents the holes from moving further up to the front contact while allowing the flow of electrons 70 . The band alignment of In0.53Ga0.47As structure was investigated in several studies 83,84 . The n-InP will form a barrier to holes, but a sink for electrons at the FSF and visa verse at the BSF/buffer.…”
Section: Multi-dimensional Optimization Using Real Coded Genetic Algomentioning
confidence: 99%