Fabrication and characterization of aluminum-molybdenum nanocomposite membranes

Hurk, Remko van den; Nelson-Fitzpatrick, Nathan; Evoy, Stéphane

doi:10.1116/1.4893671

Cited by 3 publications

(1 citation statement)

References 39 publications

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“…Although they are not supported by four beams, this type of sensing platform is used for the attachment of samples such as viruses [76]. The fabrication process includes chemical vapour deposition for SiN and sputtering for AlMo membranes, reactive ion etching of the patterned layers, and wet etching (KOH) of the silicon layer [77].…”

Section: Suspended Structuresmentioning

confidence: 99%

Fabricating Silicon Resonators for Analysing Biological Samples

et al. 2021

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The adaptability of microscale devices allows microtechnologies to be used for a wide range of applications. Biology and medicine are among those fields that, in recent decades, have applied microtechnologies to achieve new and improved functionality. However, despite their ability to achieve assay sensitivities that rival or exceed conventional standards, silicon-based microelectromechanical systems remain underutilised for biological and biomedical applications. Although microelectromechanical resonators and actuators do not always exhibit optimal performance in liquid due to electrical double layer formation and high damping, these issues have been solved with some innovative fabrication processes or alternative experimental approaches. This paper focuses on several examples of silicon-based resonating devices with a brief look at their fundamental sensing elements and key fabrication steps, as well as current and potential biological/biomedical applications.

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Section: Suspended Structuresmentioning

confidence: 99%

Fabricating Silicon Resonators for Analysing Biological Samples

et al. 2021

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Al-Mo nanocomposite functionalization for membrane-based resonance detection of bovine Herpesvirus-1

Hurk

Baghelani

Chen

et al. 2019

Sensors and Actuators A: Physical

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Use of aluminum oxide as a permeation barrier for producing thin films on aluminum substrates

Provo¹

2016

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Aluminum has desirable characteristics of good thermal properties, good electrical characteristics, good optical properties, and the characteristic of being nonmagnetic and having a low atomic weight (26.98 g atoms), but because of its low melting point (660 °C) and ability as a reactive metal to alloy with most common metals in use, it has been ignored as a substrate material for use in processing thin films. The author developed a simple solution to this problem, by putting a permeation barrier of alumina (Al2O3) onto the surface of pure Al substrates by using a standard chemical oxidation process of the surface (i.e., anodization), before additional film deposition of reactive metals at temperatures up to 500 °C for 1-h, without the formation of alloys or intermetallic compounds to affect the good properties of Al substrates. The chromic acid anodization process used (MIL-A-8625) produced a film barrier of ∼(500–1000) nm of alumina. The fact that refractory Al2O3 can inhibit the reaction of metals with Al at temperatures below 500 °C suggests that Al is a satisfactory substrate if properly oxidized prior to film deposition. To prove this concept, thin film samples of Cr, Mo, Er, Sc, Ti, and Zr were prepared on anodized Al substrates and studied by x-ray diffraction, Rutherford ion back scattering, and Auger/argon sputter surface profile analysis to determine any film substrate interactions. In addition, a major purpose of our study was to determine if ErD2 thin films could be produced on Al substrates with fully hydrided Er films. Thus, a thin film of ErD2 on an anodized Al substrate was prepared and studied, with and without the alumina permeation barrier. Films for study were prepared on 1.27 cm diameter Al substrates with ∼500 nm of the metals studied after anodization. Substrates were weighed, cleaned, and vacuum fired at 500 °C prior to use. The Al substrates were deposited using standard electron beam cold crucible evaporation techniques, and after deposition the Er film was hydrided with D2 gas using a standard nonair exposure hydriding technique. All processing was conducted in an all metal ion pumped ultrahigh vacuum system. Results showed that e-beam deposition of films studied onto Al substrates could be successfully performed, if a permeation barrier of Al2O3 from 500 to 1000 nm was made prior to thin film deposition up to temperatures of 500 °C for 1-h. Hydrides also, could be produced with full gas/metal atomic ratios of ∼2.0 as evidenced by the ErD2 films produced. Thus, the use of a simple permeation barrier of Al2O3 on Al substrates prior to additional metal film deposition was proven to be a successful method of producing both thin metal films and hydride films of various types for many applications.

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Fabrication and characterization of aluminum-molybdenum nanocomposite membranes

Cited by 3 publications

References 39 publications

Fabricating Silicon Resonators for Analysing Biological Samples

Fabricating Silicon Resonators for Analysing Biological Samples

Al-Mo nanocomposite functionalization for membrane-based resonance detection of bovine Herpesvirus-1

Use of aluminum oxide as a permeation barrier for producing thin films on aluminum substrates

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