Fabricating and Controlling Silicon Zigzag Nanowires by Diffusion-Controlled Metal-Assisted Chemical Etching Method

Chen, Yun; Zhang, Cheng; Li, Liyi; Tuan, Chia-Chi; Wu, Fan; Chen, Xin; Gao, Jian; Ding, Y.; Wong, Ching‐Ping

doi:10.1021/acs.nanolett.7b01320

Cited by 49 publications

(44 citation statements)

References 45 publications

(66 reference statements)

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“…3b. Some border effects have been reported also in wet-MacEtch: Chen et al observed a variation of etching direction going from the border to the centre as a consequence of different diffusion flux at the border; 63 with a micropattern of an Au catalyst we experienced a kind of reverse effect, with slower etching at the border. 32 In the case MacEtch in the gas phase, we observed a faster etching at the border for a pattern area of 1 cm 2 , while the etching is uniform for a patterned area of a few mm 2 .…”

Section: Etching Mechanismmentioning

confidence: 57%

Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics

et al. 2020

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Section: Etching Mechanismmentioning

confidence: 57%

Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics

et al. 2020

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“…As an alternative to RIE, metal‐assisted chemical etching (MacEtch) has been suggested. [ 15–28 ] It can fabricate high‐aspect‐ratio semiconductor nanostructures without causing crystal defects because it uses wet‐based chemical processes. Patterned metal catalysts are deposited on a semiconductor that is immersed in an etchant composed of an acid and oxidant.…”

Section: Introductionmentioning

confidence: 99%

Ultralow Optical and Electrical Losses via Metal‐Assisted Chemical Etching of Antireflective Nanograss in Conductive Mesh Electrodes

Kim

Bong

et al. 2020

Advanced Optical Materials

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Various types of anti‐reflective technologies are capable of increasing the light absorption of optical devices. The electrical conductivity of the collected carriers must also be increased for efficient photoelectric conversion. However, increasing the front electrode area reduces the amount of light absorption, causing shading and resistive losses to conflict in front‐illuminated devices. In this study, a low‐reflectance surface and high‐conductance electrode for Schottky photodiodes are fabricated using metal‐assisted chemical etching (MacEtch). Si nanograss (SiNG) and Ag‐mesh formed via MacEtch serve as a subwavelength surface and buried electrodes, respectively. SiNG increases light absorption without causing shading loss, while the buried Ag‐mesh considerably improves electrical conductivity. The SiNG/Ag‐mesh structure exhibits a solar weighted reflectance of 1.20% and a sheet resistance of 5.48 Ω □−1. The SiNG/Ag‐mesh Schottky photodiode exhibits an external quantum efficiency of 89.5% at a wavelength of 860 nm and an internal photoemission effect in the sub‐band gap. The self‐organized SiNG/Ag‐mesh, fabricated through a simple wet‐etching method, simultaneously addresses the issues of optical and electrical losses, enabling the application of this technique to a wide range of optoelectronic devices.

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“…Integrated with other advanced fabrication methods, such as RIE, metal‐assisted chemical etching (MaCE), and so on, the self‐assembled PS MCCs can be used as templates to fabricate various large‐scale nanostructure arrays, which show great potential applications in many fields . Figure exhibits several typical nanostructure arrays those are fabricated by using the self‐assembled PS MCCs as templates.…”

Section: Resultsmentioning

confidence: 99%

Interfacial Capillary‐Force‐Driven Self‐Assembly of Monolayer Colloidal Crystals for Supersensitive Plasmonic Sensors

Wang

Chen

et al. 2020

Small

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Colloidal lithography technology based on monolayer colloidal crystals (MCCs) is considered as an outstanding candidate for fabricating large‐area patterned functional nanostructures and devices. Although many efforts have been devoted to achieve various novel applicatons, the quality of MCCs, a key factor for the controllability and reproducibility of the patterned nanostructures, is often overlooked. In this work, an interfacial capillary‐force‐driven self‐assembly strategy (ICFDS) is designed to realize a high‐quality and highly‐ordered hexagonal monolayer MCCs array by resorting the capillary effect of the interfacial water film at substrate surface as well as controlling the zeta potential of the polystyrene particles. Compared with the conventional self‐assembly method, this approach can realize the reself‐assembly process on the substrate surface with few colloidal aggregates, vacancy, and crystal boundary defects. Furthermore, various typical large‐scale nanostructure arrays are achieved by combining reactive ion etching, metal‐assisted chemical etching, and so forth. Specifically, benefiting from the as‐fabricated high‐quality 2D hexagonal colloidal crystals, the surface plasmon resonance (SPR) sensors achieve an excellent refractive index sensitivity value of 3497 nm RIU−1, which is competent for detecting bovine serum albumin with an ultralow concentration of 10−8 m. This work opens a window to prepare high‐quality MCCs for more potential applications.

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Fabricating and Controlling Silicon Zigzag Nanowires by Diffusion-Controlled Metal-Assisted Chemical Etching Method

Cited by 49 publications

References 45 publications

Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics

Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics

Ultralow Optical and Electrical Losses via Metal‐Assisted Chemical Etching of Antireflective Nanograss in Conductive Mesh Electrodes

Interfacial Capillary‐Force‐Driven Self‐Assembly of Monolayer Colloidal Crystals for Supersensitive Plasmonic Sensors

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