2012
DOI: 10.1007/s00339-012-6827-4
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Fabricating a Dichroic Plasmonic Mirror in Fused Silica by Dual-Ion Implantation

Abstract: We describe a novel ion-implantation method for fabricating a dichroic nanoparticle film by controlling the nucleation and growth of silver nanoparticles in fused silica. We first implant Sc and O ions into the silica substrate to create a high-index layer and modify the shortand intermediate-range order; this dual-implantation technique defines a sharper interface between the silica substrate and the nanoparticle layer. By modifying the shortand intermediate-range order in a thin layer of the silica matrix, A… Show more

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Cited by 2 publications
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“…In the cases studied, the formation of distributions with different sizes of Si-QDs can be expected after following a different number of thermal annealing processes, and also due to the dissimilar ion-irradiation energies employed for the implantation in each sample. In addition, we consider that subsequent ion-implantation processes produces additional diffusion and nucleation processes, which can result in changes in the structure, and modification in size of the initially implanted NPs, as it has been previously suggested for dual implantation processes [27].…”
Section: Discussionmentioning
confidence: 99%
“…In the cases studied, the formation of distributions with different sizes of Si-QDs can be expected after following a different number of thermal annealing processes, and also due to the dissimilar ion-irradiation energies employed for the implantation in each sample. In addition, we consider that subsequent ion-implantation processes produces additional diffusion and nucleation processes, which can result in changes in the structure, and modification in size of the initially implanted NPs, as it has been previously suggested for dual implantation processes [27].…”
Section: Discussionmentioning
confidence: 99%