Extremely Small AWG Demultiplexer Fabricated on InP by Using a Double-Etch Process

Abstract

A compact low-loss 4 4 arrayed waveguide grating (AWG) demultiplexer with a channel spacing of 400 GHz is presented. By employing a double-etch process, a low-loss device is made with deeply etched waveguides that have a bending radius down to 30 m. This small radius and a reduction of the number of array arms, reduces the device size to only 230 330 m 2. Measured insertion losses are less than 5 dB and the crosstalk is below 12 dB. To our knowledge, this is the smallest AWG reported to date.

Discretely Tunable Laser Based on Filtered Feedback for Telecommunication Applications

“…The AWG filter was designed using a deep-shallow double etching technique as described in [16]. The layout of the AWG device is shown in Fig.…”

Generic foundry model for InP-based photonics

“…Many of the functionalities shown in Fig. 1 have been reported by COBRA: compact MMI-couplers [13] and AWGs [14], optical switches [15] and modulators [16], multi-wavelength and tunable lasers [17], flip-flops and ultrafast wavelength converters [18], picoseconds pulse lasers [19] and polarisation splitters and converters [20]. Fig.…”

Relaxed Dimensional Tolerance Whispering Gallery Microbends

“…For radii of order tens of micrometers, high refractive index contrast is required in the plane of the microbend to minimize radiation losses. This is readily achieved with deeply etched waveguides [13]- [16] and has been exploited in ultracompact arrayed waveguide gratings [17], [18]. Performance does, however, become increasingly sensitive to waveguide bend modal properties, fabrication tolerance, and polarization rotation, leading even to a body of research on polarization converters [19]- [21].…”