Extreme ultraviolet broadband Mo∕Y multilayer analyzers

Wang, Zhanshan; Wang, Hongchang; Zhu, Jingtao; Xu, Yang; Zhang, Shumin; Li, Cunxia; Wang, Fengli; Zhang, Zhong; Wu, Yongrong; Cheng, Xinbin; Chen, Lingyan; Michette, A. G.; Pfauntsch, Sławka J.; Powell, A.K.; Schäfers, F.; Gaupp, A.; MacDonald, M. A.

doi:10.1063/1.2405874

Cited by 43 publications

(30 citation statements)

References 20 publications

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“…49 The polarization degree or phase shift has to be taken into account in the merit function during multilayer design to achieve the broadband effect. [50][51][52] A high polarization degree of up to 98.7% with an average reflectance for s-polarized light of 5.5% to 6.1% has been demonstrated over the wavelength range of k ¼ 8.5-11.7 nm by Wang et al An aperiodic Mo/Y multilayer was used in this experiment and the results are shown in Figure 4. 52 A multilayer transmission phase retarder with 42 phase shift in the range of k ¼ 13.8-15.5 nm was also realized using Mo/ Si multilayers.…”

Section: Broadband Multilayer Polarizermentioning

confidence: 98%

“…56,57 The latter one is based on the different penetration depth inside the multilayer for different frequency components of the incoming light, so that a negative or positive chirp can be achieved to compensate the intrinsic chirp among the harmonics and further compress the pulse. 55,58 Based on this idea, aperiodic chirped multilayers were first designed with 52 the desired phase characteristics and for these designs an attosecond-level pulse duration was predicted. 57,59 With the advancement of the deposition techniques and various methods of phase measurements, significant progress has been achieved in chirped multilayer mirrors over the past few years.…”

Section: Broadband Multilayer For High Temporal Resolutionmentioning

confidence: 99%

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Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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Section: Broadband Multilayer Polarizermentioning

confidence: 98%

Section: Broadband Multilayer For High Temporal Resolutionmentioning

confidence: 99%

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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“…Broadband transmission measurements demonstrated that the grown BP films have a broad absorption band from 130 eV to 300 eV, as a result of the overlapping P L 2,3 , P K and B K absorption edges. This work shows that, through c-BP, the P L 2,3 -edge can in principle be employed to construct optical elements that are relatively transparent to photons with an energy below 130 eV, which can be applied in space optics [19,20], photolithography [21] and high harmonics generation [22].…”

Section: Introductionmentioning

confidence: 99%

Exploiting the P L_2,3 absorption edge for optics: spectroscopic and structural characterization of cubic boron phosphide thin films

Huber¹,

Медведев²,

Meyer-Ilse³

et al. 2016

Opt. Mater. Express

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The transmission of cubic boron phosphide (c-BP) thin films, prepared by chemical vapor deposition (CVD), was evaluated near the phosphorous L 2,3 and boron K absorption edge. The c-BP films were analyzed with transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS) and X-ray absorption near-edge spectroscopy (XANES), to study their structural and chemical properties. The TEM analysis reveals that c-BP initially grows in islands. The merging of the P L 2,3 , P K and B K absorption edges culminates in a sharp absorption feature starting at 130 eV, showing that c-BP can be used in applications that require a relatively transparent material in the energy range just below that absorption feature. Due to experimental constraints the samples were grown at a temperature significantly below the temperature for optimal crystal growth. XANES analysis showed that, as a result of the reduced crystal quality, the intensities of the absorption transitions are reduced compared to those in high quality crystalline reference samples. Optimizing the quality of the BP films will increase the contrast in transmission across the absorption edge. Prendergast, "Determining crystal phase purity in c-BP through x-ray absorption spectroscopy," Unpublished . 28. J. Underwood and E. Gullikson, "High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50-1300 eV energy region," J. Electron Spectrosc. Relat. Phenom. 92, 265 -272 (1998). 29. E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, "Recent developments in EUV reflectometry at the advanced light source," in "Emerging

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“…We mainly focus on the properties of phosphorus-based multilayer mirrors operating at around the L 2,3 absorption edge of phosphorus (P). Reflective optics operating at around the photo absorption edge of P is of interest for several applications, including extreme ultraviolet astronomy [4][5][6][7] and high-harmonic generation [8,9]. Here we theoretically examine reflective properties of planar multilayer structures with BP spacer and different reflector materials that suggest high reflectivity values.…”

Section: Introductionmentioning

confidence: 99%

Phosphorus-based compounds for EUV multilayer optics materials

Медведев¹,

Yakshin²,

Kruijs³

et al. 2015

Opt. Mater. Express

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Abstract:We have evaluated the prospects of phosphorus-based compounds in extreme ultraviolet multilayer optics. Boron phosphide (BP) is suggested to be used as a spacer material in reflective multilayer optics operating just above the L-photoabsorption edge of P (λ ≈9.2 nm). Mo, Ag, Ru, Rh, and Pd were considered for applications as reflector materials. Our calculations for multilayer structures with perfect interfaces show that the Pd/BP material combination suggests the highest reflectivity values, exceeding 70% within the 9.2 -10.0 nm spectral range. We also discuss the potential of fabrication of BP-based multilayer structures for optical applications in the extreme ultraviolet range. References and links1. E. Spiller, Soft X-ray Optics (SPIE, Bellingham, 1994). 2. J. Larruquert, "Optical properties of thin film materials at short wavelengths," in Optical Thin Films and Coatings, A. Piegari, and F. Flory, eds. (Woodhead Publishing Limited, 2013). 415-417 (2013). 11. The direct application of the solid allotropes of sulphur (S) in multilayer structures is unlikely because of its high reactivity. For that reason instead of pure S some stable S-based compounds were considered for applications in multilayer structures. This is in spite of the fact that in this situation the increased chemical stability is achieved at the expense of the optical performance. Compounds of S with any material have higher absorbance for EUV radiation than that of pure S in the wavelength range where the application of S is favorable. Hence the elements to form compounds with S should be chosen using the two following criteria: 1) high chemical stability of the resulting compound; 2) optical constants of the resulting compound close to those of pure S. The analysis of the CXRO database of the optical constants indicates that the most promising candidates are boron (B), yttrium (Y), zirconium (Zr) and strontium (Sr). Obviously phosphorus-reach compounds are still the most attractive -these are B 2 S 3 , Y 2 S 3 , ZrS 2 and SrS. However B 2 S 3 , Y 2 S 3 and SrS are decomposed by water with the release of toxic H 2 S gas. Hence they do not meet the criterion of stability, and we focused on ZrS 2 . Our calculations for multilayers with ZrS 2 spacer indicate that ZrS 2 -based multilayer structures could only add to the B-based multilayer structures within a narrow 0.3 nm range above the L absorption edge of S.

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Extreme ultraviolet broadband Mo∕Y multilayer analyzers

Cited by 43 publications

References 20 publications

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Exploiting the P L_2,3 absorption edge for optics: spectroscopic and structural characterization of cubic boron phosphide thin films

Phosphorus-based compounds for EUV multilayer optics materials

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