Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen

Astakhov, Dmitry; Goedheer, W. J.; Lee, Chris; Ivanov, V. V.; Krivtsun, V. M.; Koshelev, K. N.; Lopaev, Dmitry; Horst, R. M. van der; Beckers, JL Jozef; Osorio, EA; Bijkerk, Frederik

doi:10.1088/0022-3727/49/29/295204

Cited by 25 publications

(33 citation statements)

References 41 publications

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“…These efforts enabled modeling plasmas induced by irradiation with one single pulse of EUV radiation. It was found that an accurate set of differential cross-sections was needed for the description of the ignition of such an EUV-induced plasma, since the models' results were very sensitive to the energy distribution between the two electrons that were produced after ionization [21]. This conclusion correlates with the work of Mokrov and Riser [23], who found as well that differential cross-sections were crucial for an accurate description of ionization coefficients.…”

Section: Recent Numerical Work On Euv-induced Bulk Plasmassupporting

confidence: 60%

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EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology

et al. 2019

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After a long period of relatively low interest, science related to effects in the Extreme Ultraviolet (EUV) spectrum range experienced an explosive boom of publications in the last decades. A new application of EUV in lithography was the reason for such a growth. Naturally, an intensive development in such area produces a snowball effect of relatively uncharted phenomena. EUV-induced plasma is one of those. While being produced in the volume of a rarefied gas, it has a direct impact onto optical surfaces and construction materials of lithography machines, and thus has not only scientific peculiarity, but it is also of major interest for the technological application. The current article provides an overview of the existing knowledge regarding EUV-induced plasma characteristics. It describes common, as well as distinguishing, features of it in comparison with other plasmas and discusses its interaction with solid materials. This article will also identify the gaps in the existing knowledge and it will propose ways to bridge them.

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Section: Recent Numerical Work On Euv-induced Bulk Plasmassupporting

confidence: 60%

“…The next steps included the development of an EUV-induced plasma tailored two-dimensional particle-in-cell code, which several experiments validated [21,22]. These efforts enabled modeling plasmas induced by irradiation with one single pulse of EUV radiation.…”

Section: Recent Numerical Work On Euv-induced Bulk Plasmasmentioning

confidence: 99%

EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology

et al. 2019

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“…The spectrum has been published by Astakhov and Van der Horst. 21,23 98% of the radiation energy is within the 10 to 20 nm bandwidth. In the past, the transmission of multiple SPFs has been measured to ensure that the transmission is not SPF specific.…”

Section: Methodsmentioning

confidence: 99%

“…41 Numerical simulations have shown that at 5 Pa, approximately one electron impact ionization takes place for each photoionization. 23 Therefore, the contribution of dissociative electron impact ionization is roughly equal to that of double photoionization.…”

Section: B Energetic Tailmentioning

confidence: 99%

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Ion energy distributions in highly transient EUV induced plasma in hydrogen

Ven

Reefman

Meijere

et al. 2018

Journal of Applied Physics

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This work reports on the measurements of ion flux composition and ion energy distribution functions (IEDFs) at surfaces in contact with hydrogen plasmas induced by extreme ultraviolet (EUV) radiation. This special type of plasma is gaining interest from industries because of its appearance in extreme ultraviolet lithography tools, where it affects exposed surfaces. The studied plasma is induced in 5 Pa hydrogen gas by irradiating the gas with short (30 ns) pulses of EUV radiation (k ¼ 10-20 nm). Due to the low duty cycle (10-4), the plasma is highly transient. The composition and IEDF are measured using an energy resolved ion mass spectrometer. The total ion flux consists of H þ ; H þ 2 , and H þ 3. H þ 3 is the dominant ion as a result of the efficient conversion of H þ 2 to H þ 3 upon collision with background hydrogen molecules. The IEDFs of H þ 2 and H þ 3 appear similar, showing a broad distribution with a cutoff energy at approximately 8 eV. In contrast, the IEDF of H þ shows an energetic tail up to 18 eV. Most probably, the ions in this tail gain their energy during their creation process by photoionization and dissociative electron impact ionization.

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Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light

Mund

Sturm

Lee

et al. 2018

Applied Surface Science

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In this paper we study the reaction of water and graphene under Extreme Ultraviolet (EUV) irradiation and in the presence of hydrogen. In this work, single layer graphene (SLG) on amorphous Si as an underlying substrate was dosed with water (0.75 mL) and exposed to EUV (= 13.5 nm, 92 eV) with partial pressures of H 2 in the background. The results show that the aromatic structure of graphene, when exposed to EUV and H 2 , breaks down into aryl ketones and enols of 1,3 di-ketone. Infrared (IR) spectroscopy shows that SLG oxidizes, with increasing H 2 pressure leading to the grain boundary edges of graphene forming ketones and carboxylic acids. In situ and post exposure analyses also reveal that EUV exposure reduces the sp 2 content of the graphene layer, with the sp 3 content increasing, resulting in a more defective graphene layer.

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Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen

Cited by 25 publications

References 41 publications

EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology

EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology

Ion energy distributions in highly transient EUV induced plasma in hydrogen

Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light

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