2013 7th International Congress on Advanced Electromagnetic Materials in Microwaves and Optics 2013
DOI: 10.1109/metamaterials.2013.6809020
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Experimentally feasible green-light negative index metamaterial

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“…1 can be fabricated by self-aligned electronbeam lithography exposures and dielectric layer deposition via atomic layer deposition by choosing, for example, Ag as the metal and Al2O3 as the dielectric. Considering the experimental data [66] and misalignments, we have previously verified [67] that the negative index persists. We have confirmed through a series of sensitivity analyses that the structure is also tolerant to other imperfections possible at different stages of the fabrication process including the variations in dielectric thickness (i.e., change from 8nm to 15nm), dielectric surface roughness (i.e., within ± 10% of the average thickness), and strip width (i.e., ± 2.5% change).…”
mentioning
confidence: 80%
“…1 can be fabricated by self-aligned electronbeam lithography exposures and dielectric layer deposition via atomic layer deposition by choosing, for example, Ag as the metal and Al2O3 as the dielectric. Considering the experimental data [66] and misalignments, we have previously verified [67] that the negative index persists. We have confirmed through a series of sensitivity analyses that the structure is also tolerant to other imperfections possible at different stages of the fabrication process including the variations in dielectric thickness (i.e., change from 8nm to 15nm), dielectric surface roughness (i.e., within ± 10% of the average thickness), and strip width (i.e., ± 2.5% change).…”
mentioning
confidence: 80%