2002
DOI: 10.1016/s0040-6090(02)00007-x
|View full text |Cite
|
Sign up to set email alerts
|

Experimental study of fullerene-family formation using radio-frequency-discharge reactive plasmas

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
15
0

Year Published

2005
2005
2018
2018

Publication Types

Select...
5
2
1

Relationship

0
8

Authors

Journals

citations
Cited by 25 publications
(16 citation statements)
references
References 15 publications
0
15
0
Order By: Relevance
“…The resulting properties are a function of the composition, structural order and the micro/ nanostructure of the coatings [2]. In addition, particles of different sizes and shapes grow naturally in RF plasmas [3][4][5][6][7]. Carbon based particles like fullerenes [3], and carbon spheres [4,6,7] have been reported.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…The resulting properties are a function of the composition, structural order and the micro/ nanostructure of the coatings [2]. In addition, particles of different sizes and shapes grow naturally in RF plasmas [3][4][5][6][7]. Carbon based particles like fullerenes [3], and carbon spheres [4,6,7] have been reported.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, particles of different sizes and shapes grow naturally in RF plasmas [3][4][5][6][7]. Carbon based particles like fullerenes [3], and carbon spheres [4,6,7] have been reported. Carbon spheres can be produced with control in chemical composition, crystallinity, and diameter [8], allowing a wide spectrum of applications.…”
Section: Introductionmentioning
confidence: 99%
“…RF-discharge reactive plasmas have been successfully used to produce carbon nanostructures such as fullerenes and nanotubes from gaseous mixtures of CH 4 , H 2 , and Ar, at pressures in the range 10 -3 -10 Torr. [43] In Figure 6 a scheme of the apparatus is shown. The plasma is generated…”
Section: Plasma-enhanced Cvdmentioning
confidence: 99%
“…However, the most important purpose of using plasma is the outcome of uniform alignment of CNTs due to their interaction with the electric field [71]. There are many methods used to generate plasma, including radio-frequency (RF) plasma [72,73], microwave plasma [74][75][76], and direct-current (DC) plasma [77][78][79]. Regardless of the plasma source used, the key aspect is the generation of electric fields on the wafer surface in the plasma sheath.…”
Section: Pecvd System and Cnt Synthesis Processmentioning
confidence: 99%