Fabrication, Field Emission Properties and Theoretical Simulation of Triode-Type Carbon Nanotube Emitter Arrays

Abstract

Carbon nanotubes exhibit excellent field emission properties and will likely be prime candidates as electron sources in future vacuum electronic applications. Recent research has focused on enhancing field emission from traditional diode-type emitters by adding a gate electrode between the anode and the cathode. Since the gate to cathode (emitter) distance in this triode-type structure is small relative to the anode to cathode distance, this structure allows relatively small gate voltages to significantly enhance or dampen field emission. The key challenge for this research is: synthesizing vertically aligned carbon nanotube field emitters inside arrays of triodetype devices. The most common "top-down", etch-deposit-synthesis method of synthesizing carbon nanotubes inside gated cavities is discussed here, and a novel "bottom-up" method is presented. This new approach bypasses the lithography and wet chemistry essential to the etch-deposit-synthesis method, instead using a dual-beam focused ion beam (FIB) system to mill cavities into a multi-layered substrate. Here the substrate is designed such that the act of milling a hole simultaneously creates the gate structure and exposes the catalyst from which carbon nanotubes can then be grown. Carbon nanotubes are synthesized using plasma enhanced chemical vapor deposition (PECVD) rather than thermal chemical vapor deposition, due to the superior alignment of the PECVD growth. As dual-beam FIB and PECVD can both be largely computerized, this synthesis method is highly reproducible. The dual-beam FIB also permits a high degree of controllability in gate radius, cavity depth and emitter I feel lucky to work with Prof. Jun Jiao's research group. I would like to thank