Experimental study of formation kinetics in a discharge-pumped F2 laser

Red-F* Laser and VUV-F2 Emission Pumped at Low Pressure by Longitudinal, Lamp-Like Discharge

“…According to the references [3,[6][7][8], the rate constant of this reaction is slow (8.2× 10 −30 cm 6 /s). This reaction does not explain the fast-rising red-F * laser observed at the start of the discharge.…”

“…The lamp, which uses dielectric barrier discharge (DBD), is excited by a slow-rising AC voltage, which is directly applied to the discharge tube [1]. On the other hand, the laser requires a fast discharge, driven by a low-inductance circuit, such as a capacitor-transfer circuit, with a fast-rising switch [2][3][4].…”

“…Previously, we developed a longitudinally excited VUV-F 2 laser (λ = 157 nm) with a fast discharge, using a capacitor-transfer circuit at low pressure [4]. However, in the VUV-F 2 , laser oscillation at low pressure, the red-F * laser (λ = 630-780 nm), which oscillates by transverse discharge excitation scheme at high pressure [3,4], did not oscillate.…”

Role of pressure in transport of F- ions in BF3 gas for technological applications

“…The negative halogen ions are abundant in various forms of nonequilibrium plasmas relevant to applications such as excimer lasers [9] and electrical discharges, biomedical devices, nanotechnologies and in radiation chemistry in the atmosphere. For example, it is experimentaly found that negative ions are able to taylor increase of the etch rate and to improve the etch profile [10].…”

Cross-Sections and Transport Properties of F-Ions in F2

“…The negative halogen ions are abundant in various forms of nonequilibrium plasmas relevant to applications such as excimer lasers [4,5] and electrical discharges, biomedical devices, nanotechnologies and in radiation chemistry in the atmosphere. For example, it is experimentally found that negative ions are eective for increasing the etch rate and improving the etch prole [6].…”