Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Lai, Kafai; Rosenbluth, Alan E.; Bagheri, Saeed; Hoffnagle, John A.; Tian, Kehan; Melville, David O. S.; Tirapu-Azpiroz, Jaione; Fakhry, Moutaz; Kim, Young; Halle, Scott; McIntyre, Greg; Wagner, Alfred; Burr, Geoffrey W.; Burkhardt, Martin; Corliss, Daniel; Gallagher, Emily; Faure, Tom; Hibbs, M.; Flagello, Donis G.; Zimmermann, J.; Kneer, Bernhard; Rohmund, F.; Hartung, Frank; Hennerkes, Christoph; Maul, Manfred; Kazinczi, Robert; Engelen, André; Carpaij, Rene; Groenendijk, Remco; Hageman, J.; Russ, Carsten

doi:10.1117/12.814680

Cited by 45 publications

(29 citation statements)

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“…2(a), the two interference terms overlap with the quadratic term and with each other. We need three measurements to retrieve both parts of these two interference terms [4,27]. One of them is the original intensity measurement I 0 (k), which corresponds to the case of γ = 0, and the other two measurements, I C (k) and I D (k, correspond to two different perturbation values, γ C and γ D ), at the same perturbation location.…”

Section: Methods For Retrieving the Interference Termsmentioning

confidence: 99%

“…However, the measurement of spatial coherence is remarkably challenging, which limits the control and the optimization of spatial coherence in a broad range of key applications such as beam shaping [1,2], optical communication through a turbulent atmosphere [3], illumination for advanced imaging systems (e.g. optical lithography) [4] and superresolution imaging [5]. The spatial coherence of a beam is described by the complexvalued 4-dimensional mutual coherence function (MCF).…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Spatial coherence measurement and partially coherent diffractive imaging using self-referencing holography

Shao¹,

Lu²,

Konijnenberg³

et al. 2018

Opt. Express

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Section: Methods For Retrieving the Interference Termsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Spatial coherence measurement and partially coherent diffractive imaging using self-referencing holography

Shao¹,

Lu²,

Konijnenberg³

et al. 2018

Opt. Express

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“…1-3 SMO has been an important part of technology development since the 22 nm logic node. 4 Reliance on the technique is expected to continue even as next-generation lithography approaches like Extreme Ultra-Violet (EUV) lithography are introduced. 5 Due to the many degrees of freedom involved in the joint optimization, practical SMO implementations require that patterning input targets be sampled using either clips created from design requirements or clips trimmed from a larger design.…”

Section: Introductionmentioning

confidence: 99%

Full-flow RET creation, comparison, and selection

Lafferty

Silakov

et al. 2014

SPIE Proceedings

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Patterning scaling trends are expected to continue until at least the 5 nm node. With the introduction of EUV now delayed until at least the 7 nm node, 193i patterning will continue mainstream use for the foreseeable future. This scaling increases reliance on optimized OPC and illumination and imposes strict requirements on RET solutions, which we define here as source, optics, and mask synthesis (including SRAF). Along with the patterning requirements, any solution must be calculated efficiently. To meet these requirements, a new RET Selection flow has been built using the Calibre platform. This flow includes SMO, Mask synthesis to further tune the output mask, Verification, and Analysis. The entire flow is session based, allowing runs to be cloned, queued, and compared. The flow is built on a robust GUI framework featuring persistent database integration. The central component of the flow is a new SMO algorithm that offers improved scalability using parallel implementation, and improved accuracy using thick mask modeling and resist models. Lithography-aware mask manufacturability limit enforcement is possible using an integrated inverse lithography tool. This also allows large area patterns to be included for RET benchmarking purposes. Finally, the analysis and visualization stages of the flow allow a particular solution to be compared against other candidates using any image metric desired. Comparison metrics can be customized for layer and customer requirements. In this paper, we will summarize the key points of our flow, and demonstrate it using several experiments.

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“…Since the amount of allowable CD error is proportional to a final pattern size, CD accuracy on each exposure is to be more critical even though the pitch may be wider than the splitting one. Usually allowable printing errors have been based on building up an error budget for each component of (1) variation of dose/focus and alignment accuracy in scanner, (2) accuracy of CD and in-plane-distortion in mask and (3) modeling error on a model base optical proximity correction to empirical data in computational lithography for demands of CD uniformity (CDU), optical proximity effect (OPE) and OVL. The budgeting and reducing of each component are reaching limits.…”

Section: Introductionmentioning

confidence: 99%

Scanner performance predictor and optimizer in further low-k1 lithography

et al. 2014

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Due to the importance of errors in lithography scanners, masks, and computational lithography in low-k1 lithography, application software is used to simultaneously reduce them. We have developed "Masters" application software, which is all-inclusive term of critical dimension uniformity (CDU), optical proximity effect (OPE), overlay (OVL), lens control (LNS), tool maintenance (MNT) and source optimization for wide process window (SO), for compensation of the issues on imaging and overlay.In this paper, we describe the more accurate and comprehensive solution of OPE-Master, LNS-Master and SO-Master with functions of analysis, prediction and optimization. Since OPE-Master employed a rigorous simulation, a root cause of error in OPE matching was found out. From the analysis, we had developed an additional knob and evaluated a proofof-concept for the improvement. Influence of thermal issues on projection optics is evaluated with a heating prediction, and an optimization with scanner knobs on an optimized source taken into account mask 3D effect for obtaining usable process window. Furthermore, we discuss a possibility of correction for reticle expansion by heating comparing calculation and measurement.

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Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Cited by 45 publications

References 0 publications

Spatial coherence measurement and partially coherent diffractive imaging using self-referencing holography

Spatial coherence measurement and partially coherent diffractive imaging using self-referencing holography

Full-flow RET creation, comparison, and selection

Scanner performance predictor and optimizer in further low-k1 lithography

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