2010
DOI: 10.1088/0268-1242/26/1/014034
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Experimental and theoretical investigations on the phase purity of GaAs zincblende nanowires

Abstract: Interesting phenomena of GaAs nanowire growth have been observed. The nanowires were grown by metal-organic chemical vapor deposition (MOCVD) on GaAs (1 1 1)B substrates with an Au catalyst at 464 • C. The growth rates of all nanowires were almost the same for a fixed density of Au nanodrops. TEM analysis demonstrates a stacking-fault-free zincblende structure of the nanowires even when their radius is reduced to as small as 12 nm. A theoretical model is developed that is capable of describing the critical rad… Show more

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Cited by 27 publications
(27 citation statements)
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“…Even though the Ga concentration in catalysts varied from size to size, nanowires can still reach the same height due to the limited As available in the vapor. Moreover, the dramatically slow growth of nanowires at the low V/III ratio can be considered as a near equilibrium process, 50 where the formation of low-energy {1100} side-facets (refer to Figure 1a) 51 and the formation of perfect crystal structure are favorable.…”
Section: Resultsmentioning
confidence: 99%
“…Even though the Ga concentration in catalysts varied from size to size, nanowires can still reach the same height due to the limited As available in the vapor. Moreover, the dramatically slow growth of nanowires at the low V/III ratio can be considered as a near equilibrium process, 50 where the formation of low-energy {1100} side-facets (refer to Figure 1a) 51 and the formation of perfect crystal structure are favorable.…”
Section: Resultsmentioning
confidence: 99%
“…Twin free ZB GaAs NWs with diameter between 30 and 50 nm on typical length of some micrometers were grown by metal-organic vapor phase epitaxy (MOVPE) implementing controlled experimental parameters of temperature and V/III ratio, which should be low and high, respectively. [18][19][20] In this paper, we present the Au catalyst-assisted growth of GaAs nanowires by using the hydride vapor phase epitaxy (HVPE) process. HVPE makes use of GaCl growth precursors.…”
Section: Introductionmentioning
confidence: 99%
“…Верхняя граница для химических потенциалов является доста-точно резкой, т. е. вблизи µ max ННК растут либо в одной, либо в другой фазе [8][9][10][11][12][13]. Рост ННК вблизи нижней границы может происходить с образованием политипов [10,[13][14][15][16].…”
Section: международный симпозиум "unclassified
“…Для экспериментального наблю-дения химический потенциал лучше всего связывать со скоростью роста ННК. Большие скорости роста ННК означают большие разности химических потенциалов, малые скорости роста ННК -малые разности хи-мических потенциалов [11]. Однако такое сопоставле-ние корректно делать только для квазистационарного роста ННК.…”
Section: международный симпозиум "unclassified