Experimental and theoretical investigation on the inhibition performance of disulfide derivatives on cobalt corrosion in alkaline medium

Ma, Tengda; Tan, Baimei; Guo, Lei; Wang, Wantang; Li, Wei; Ji, Jinbo; Yan, Mei

doi:10.1016/j.molliq.2021.116907

Cited by 25 publications

(15 citation statements)

References 43 publications

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“…The inhibitive effect of three disulfides flavoring agents (PPD, DBD, and DAD) on copper in 0.5 M H 2 SO 4 was investigated via electrochemical and computational techniques by Tan et al The study reported excellent inhibition efficacies of 98.5% (PPD), 92.10% (DBD), and 91.50% (DAD) with a maximum concentration of 5 mM at 298 K. Recently, an extensive study was conducted on the corrosion protection of cobalt in alkaline solution using two disulfide compounds, 2,2-dibenzamidodiphenyl disulfide and 3,3-dithiodipropionic acid. The study established that the studied disulfide derivatives excellently impeded galvanic corrosion and their inhibition mechanism complied with the Langmuir adsorption model . Another report explored the relationship between the number of heteroatoms in three disulfide compounds and their adsorption potential on copper in sulfuric acid using electrochemical and surface analyses and theoretical calculations …”

Section: Introductionmentioning

confidence: 57%

“…The study established that the studied disulfide derivatives excellently impeded galvanic corrosion and their inhibition mechanism complied with the Langmuir adsorption model. 19 Another report explored the relationship between the number of heteroatoms in three disulfide compounds and their adsorption potential on copper in sulfuric acid using electrochemical and surface analyses and theoretical calculations. 20 Thiuram disulfide compounds are generally synthesized via oxidation of the suitable dithiocarbamate salts using iodine.…”

Section: Introductionmentioning

confidence: 99%

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Formamidine-Based Thiuram Disulfides as Efficient Inhibitors of Acid Corrosion of Mild Steel: Electrochemical, Surface, and Density Functional Theory/Monte Carlo Simulation Studies

et al. 2022

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Electrochemical, surface, and density functional theory (DFT)/Monte Carlo (MC) simulation studies were used in investigating the characteristics of N , N ′-(disulfanne-1,2-dicarbonothioyl)bis( N , N ′-bis(2,6-dimethylphenyl)formimidamide) ( DS1 ), N , N ′-(disulfanne-1,2-dicarbonothioyl)bis( N , N ′-bis(2,6-diisopropylphenyl)formimidamide) ( DS2 ), N , N ′-(disulfanne-1,2-dicarbonothioyl)bis( N , N ′-dimesitylformimidamide) ( DS3 ), and N , N ′-(disulfanne-1,2-dicarbonothioyl)bis( N , N ′-bis(2,6-dichlorophenyl)formimidamide) ( DS4 ) as inhibitors of acid corrosion of mild steel. The inhibitors were found to effectively reduce the rates of steel dissolution at the anode as well as cathodic hydrogen evolution. The order of inhibition efficiencies of studied compounds is DS1 (PDP/LPR/EIS: 98.60/97.98/96.94%) > DS2 (PDP/LPR/EIS: 98.36/96.86/96.90%) > DS3 (PDP/LPR/EIS: 94.66/87.44/94.30%) > DS4 (PDP/LPR/EIS: 83.57/77.02/75.17%) at 1.00 mM, and the overall efficiencies appeared to depend on the molecular and electronic structures of the compounds. The compounds offered high resistance to charge transfer across the electrode/electrolyte system by forming adsorbed film whose resistance increased with an increase in concentration. Findings suggested that the adsorption process involved combined chemisorption and physisorption. DFT calculations and MC simulations provided theoretical justifications for the experimental results.

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Section: Introductionmentioning

confidence: 57%

Section: Introductionmentioning

confidence: 99%

Formamidine-Based Thiuram Disulfides as Efficient Inhibitors of Acid Corrosion of Mild Steel: Electrochemical, Surface, and Density Functional Theory/Monte Carlo Simulation Studies

et al. 2022

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“…However, the overall changes in the slopes of the Tafel curve are small, suggesting that the inhibitors primarily function to reduce the corrosive effect is covering on the Cu surface, without affecting the corrosion mechanism. 36 Analysis of Nyquist and Bode plots.-Nyquist and Bode plots can further analyze the passivation film formed on Cu surface. As shown in Figs.…”

Section: Resultsmentioning

confidence: 99%

“…9, the E HOMO of 2-ABT and 2-ABI are higher than the Fermi level of Cu (111), indicating that the electrons are more readily transferred from the inhibitors HOMO orbital to the empty Cu-d orbital to reach the most stable state. 36 The order of the HOMO and LUMO values of the three studied inhibitors are 2-ABI > 2-ABT > ABT. However, there are only a small difference in ΔE-values between the three inhibitors.…”

Section: Lumo Homomentioning

confidence: 92%

Multi-Scale Insight into Inhibition Mechanism of Benzo Derivatives in Chemical Mechanical Polishing of Copper Film Based on Experiments and Theoretical Calculations

Liu

Niu

Zhan

et al. 2023

ECS J. Solid State Sci. Technol.

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To protect the copper (Cu) surfaces from corrosion during chemical mechanical polishing (CMP), selecting appropriate inhibitors are critical. Benzo and its derivatives are potential superior inhibitors due to their diverse heteroatoms and environmentally friendliness. In this study, benzothiazole (ABT), 2-benzothiazolamine (2-ABT) and 2-aminobenzimidazole (2-ABI) were used as inhibitors to investigate the effect of molecular structure on the inhibition performance through experimental and theoretical calculation. With the addition of inhibitors, the removal rates were all inhibited effectively and the inhibition efficiency was in the following order: 2-ABI > 2-ABT > ABT. Electrochemical experiments and surface morphology tests demonstrated that the inhibitors could prevent corrosion by forming dense passivation film on Cu surfaces with a high inhibition efficiency of 88%, 94 %, and 95%, and improve the surface quality after CMP. Calculation results revealed that the introduction of amino groups (–NH2) and nitrogen(N) atom into five-membered ring enhanced the inhibition effect due to the larger adsorption energy, stronger ability to contribute electrons and denser passivation film which consistent with the experiment. Such study confirms the benzimidazole derivatives are potentially inhibitor for Cu film CMP and provides a new reference to design and select novel inhibitors.

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“…27,39 The smaller the ΔE value, the easier the transition of electrons from HOMO to LUMO, the greater the likelihood of chemical change in the molecule, and the easier it is to cause chemical adsorption. 29,45 As shown in Table IV, the ΔE values of CAO, LAPAO and DTAC are lower than those of JFCE, TX100 and OA12. Therefore, the probability of chemisorption of DIW and the six surfactants with SiO 2 is listed from high to low: LAPAO > CAO > DTAC > TX100 > OA12 > JFCE > DIW.…”

Section: Lumo Homomentioning

confidence: 92%

The Effect of Surfactants on the Removal of Ceria Particles in the Buff Clean Process

Wang

Sun

et al. 2023

ECS J. Solid State Sci. Technol.

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We have established a new buff clean method using deionized water (DIW) with 2000 ppm surfactants to remove ceria particles from the surface of SiO2 after chemical mechanical polishing. Six kinds of surfactants have been compared. The scanning electron microscopy and atomic force microscopy results show that with CAO and LAPAO, the ceria particles can be fully removed in the buff clean process. The molecular activity and adsorption energy of surfactants are calculated based on the density functional theory to clarify the mechanism of the buff clean process. The surfactants adsorbing on the SiO2 surface can be fully removed after the buff clean process.

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Experimental and theoretical investigation on the inhibition performance of disulfide derivatives on cobalt corrosion in alkaline medium

Cited by 25 publications

References 43 publications

Formamidine-Based Thiuram Disulfides as Efficient Inhibitors of Acid Corrosion of Mild Steel: Electrochemical, Surface, and Density Functional Theory/Monte Carlo Simulation Studies

Formamidine-Based Thiuram Disulfides as Efficient Inhibitors of Acid Corrosion of Mild Steel: Electrochemical, Surface, and Density Functional Theory/Monte Carlo Simulation Studies

Multi-Scale Insight into Inhibition Mechanism of Benzo Derivatives in Chemical Mechanical Polishing of Copper Film Based on Experiments and Theoretical Calculations

The Effect of Surfactants on the Removal of Ceria Particles in the Buff Clean Process

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