1984
DOI: 10.1002/pssa.2210810102
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Exclusion Effect in Semiconductors with Non-Injecting Contacts

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Cited by 17 publications
(11 citation statements)
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“…), probably due to the ionization of defect‐related deep levels and overheating of the electron gas . The S‐type IUC could also be explained by the “exclusion effects” that appear in structures containing n + –n and p + –n junctions. The effect is related to the depletion of both types of charge carriers and a high resistance of the near‐contact n + –n region when the hole injection from the p into the n region is low.…”
Section: Current–voltage Characteristicsmentioning
confidence: 99%
“…), probably due to the ionization of defect‐related deep levels and overheating of the electron gas . The S‐type IUC could also be explained by the “exclusion effects” that appear in structures containing n + –n and p + –n junctions. The effect is related to the depletion of both types of charge carriers and a high resistance of the near‐contact n + –n region when the hole injection from the p into the n region is low.…”
Section: Current–voltage Characteristicsmentioning
confidence: 99%
“…It is known (see, e.g., 15 t o 71) that the majority carrier capture in compensated seniiconductors involves overcoming the Coulomb potential barrier a t a deep level. The barrier height decreases under the action of a sufficiently strong field E exceeding the critical value E,, the carrier trapping cross-section increases for this reason, and exactly this fact causes the decrease in carrier 1ifetime.The action of the field results in a decreased ratio of majority and minority carrier lifetimes, and consequently, in a worse fulfilment of the conditions necessary for the realization of a highly developed exclusion effect [2]. Physically, a decrease in the lifetime trio of majority carriers with increasing field means t h a t the rate of electron thermo-arid photogeneration from deep levels rises and, as a result, the exclusion effect becomes weaker under the action of field.…”
Section: Physical Prerequisities For Tho Theorymentioning
confidence: 99%
“…According to [5], the bipolar continuity equation for a wide range of variation in the impurity concentration Ni, (for definiteness, in donor concentration N D ) from the values corresponding to impurity conductivities greater than, equal to, or smaller than the intrinsic conductivity (ND 5 ni) to the values far smaller than it ( N , < mi), is of the form where D, and pa are the ambipolar diffusion factor and carrier drift mobility described…”
Section: Derivation Of a More General Distribution Of Current Carriermentioning
confidence: 99%
“…are the concentrations of electrons and holes, respectively, with exclusion; all other symbols are the same as in [5]. Since the exclusion effect is caused by the action of field [5], the first (diffusion) term of (1) is negligible as compared with the second (drift) one, and after using (5a) of [5] and provided D,(d2p/dx2) < paEj(dp/dx), the equation acquires the form + ND and where By integrating ( 2 ) we find the expression for the hole concentration in the basic n-semiconductor of length L,…”
Section: Derivation Of a More General Distribution Of Current Carriermentioning
confidence: 99%