2003
DOI: 10.1103/physrevb.67.193305
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Excitonic binding in coupled quantum wells

Abstract: We study excitonic states in the presence of applied electric field in 8-nm GaAs coupled quantum wells ͑QW's͒ separated by a 4-nm Al 0.33 Ga 0.67 As barrier and in 6-nm In 0.1 Ga 0.9 As coupled QW's separated by a 4-nm GaAs barrier in which effects attributed to macroscopically ordered excitonic states have been recently reported. We discuss the differences in the nature of the states and in the origin of confinement which determines the change of excitonic properties with increase in the applied electric fiel… Show more

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Cited by 65 publications
(61 citation statements)
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“…For N ¼ 2 we find r x ¼ 2.50 nm ¼ 2.43a x and E ind ¼ 87 meVE0.6 Ry x . This binding energy is an order of magnitude larger than E ind ¼ 4-10 meV typical for excitons in GaAs/AlGaAs CQW structures 29,34 .…”
Section: Methodsmentioning
confidence: 97%
“…For N ¼ 2 we find r x ¼ 2.50 nm ¼ 2.43a x and E ind ¼ 87 meVE0.6 Ry x . This binding energy is an order of magnitude larger than E ind ¼ 4-10 meV typical for excitons in GaAs/AlGaAs CQW structures 29,34 .…”
Section: Methodsmentioning
confidence: 97%
“…In this case only one in-plane mass is relevant at low temperature. This figure also shows a curve for the same parameters but Ry = 4 meV, with the same exciton Bohr radius, which are realistic parameters for indirect excitons in double quantum wells, which have been used in recent experiments [13,14]. It is perhaps surprising that excitons exist all the way up to 100 K or above at these densities.…”
Section: Calculations For a Two-dimensional Systemmentioning
confidence: 96%
“…In the opposite limit of photon coupling, the system of spatially-indirect excitons (IXs) in a pair of coupled quantum wells (CQWs) interacts only very weakly with photons [9][10][11] . Indirect excitons, also often referred to as interwell excitons, are comprised of conduction-band electrons and valence-band holes forced by an electric field to reside in adjacent wells, separated spatially in the wafer growth direction.…”
Section: Introductionmentioning
confidence: 99%