2020
DOI: 10.1021/acsami.0c02393
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Exceptionally Uniform and Scalable Multilayer MoS2 Phototransistor Array Based on Large-Scale MoS2 Grown by RF Sputtering, Electron Beam Irradiation, and Sulfurization

Abstract: Two-dimensional molybdenum disulfide (MoS2) has emerged as a promising material for optoelectronic applications because of its superior electrical and optical properties. However, the difficulty in synthesizing large-scale MoS2 films has been recognized as a bottleneck in uniform and reproducible device fabrication and performance. Here, we proposed a radio-frequency magnetron sputter system, and post-treatments of electron beam irradiation and sulfurization to obtain large-scale continuous and high-quality mu… Show more

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Cited by 63 publications
(31 citation statements)
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References 51 publications
(95 reference statements)
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“…The main mechanism for the high R ph of the bilayer MoS 2 phototransistor is PG effect by the holes trapped at subgap states 33 , 52 55 . The TEM and XPS analysis in Fig.…”
Section: Resultsmentioning
confidence: 99%
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“…The main mechanism for the high R ph of the bilayer MoS 2 phototransistor is PG effect by the holes trapped at subgap states 33 , 52 55 . The TEM and XPS analysis in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…3b , the morphology of the MoS 2 film appears smooth and consists of several grains. The corresponding fast Fourier transform pattern shows numerous spots forming halo rings, indicating that the MoS 2 film has several random crystallite orientations 33 . According to Supplementary Fig.…”
Section: Resultsmentioning
confidence: 99%
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“…However, thermodynamics favors the existence of stabilized basal planes and hinders the formation of unsaturated electrons and highly energetic oxidizing agents under coordinated edge sites, obstructing the activating of inert base planes. Hence, extensive efforts have been devoted to actively maximize the unutilized base planes of 2H-MoS 2 , which is mainly adopted in the methods of developing defect-rich MoS 2 structures , and doping other atoms (Zn, Co, etc. , ). Technically, substituting S atoms with other atoms is anticipated to be exercisable versus the complexity of introducing defects.…”
Section: Introductionmentioning
confidence: 99%
“…However, poor reproducibility and uniformity of exfoliated MoS 2 flakes significantly limit their practical applications. In this regard, massive efforts to grow large-area and high-crystalline MoS 2 films have been devoted, and a feasibility of diverse growth methods has been demonstrated, including chemical vapor deposition (CVD) 33,34 , atomic layer deposition (ALD) 35,36 , and physical vapor deposition (PVD) 37,38 . Nonetheless, the poor reliability and reproducibility of CVD owing to the unstable gas flow dynamic in the chamber as well as high-cost and low throughput of ALD reduce the availability of rather efficient and scalable growth techniques.…”
mentioning
confidence: 99%