“…However, poor reproducibility and uniformity of exfoliated MoS 2 flakes significantly limit their practical applications. In this regard, massive efforts to grow large-area and high-crystalline MoS 2 films have been devoted, and a feasibility of diverse growth methods has been demonstrated, including chemical vapor deposition (CVD) 33,34 , atomic layer deposition (ALD) 35,36 , and physical vapor deposition (PVD) 37,38 . Nonetheless, the poor reliability and reproducibility of CVD owing to the unstable gas flow dynamic in the chamber as well as high-cost and low throughput of ALD reduce the availability of rather efficient and scalable growth techniques.…”