2012
DOI: 10.1016/j.jallcom.2012.05.018
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Evolution of enhanced crystallinity and mechanical property of nanocomposite Ti–Si–N thin films using magnetron reactive co-sputtering

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Cited by 28 publications
(7 citation statements)
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“…Further, combined FEM with nanoindentation approach predicts the values of yield stress of the as-deposited VO-MO film as 210 MPa which is also improved to 412 MPa. The increase in crystallinity due to annealing7273 is believed to be the reason behind the improvement of mechanical properties of the present VO-MO films.…”
Section: Resultsmentioning
confidence: 86%
“…Further, combined FEM with nanoindentation approach predicts the values of yield stress of the as-deposited VO-MO film as 210 MPa which is also improved to 412 MPa. The increase in crystallinity due to annealing7273 is believed to be the reason behind the improvement of mechanical properties of the present VO-MO films.…”
Section: Resultsmentioning
confidence: 86%
“…In particular, significant amount of efforts have been devoted to decreasing the temperature at which hard coatings are formed and improving the properties of these coatings to increase their hardness and oxidation resistance. Ternary Ti-Al-N [2,3] and Ti-Si-N [4,5] systems with higher hardness values and oxidation resistances than their TiN binary counterparts have been developed.…”
Section: Introductionmentioning
confidence: 99%
“…Ternary Ti-Al-N [2,3] and Ti-Si-N [4,5] systems with higher hardness and oxidation resistance values than those of their TiN binary counterparts have been developed.…”
Section: Introductionmentioning
confidence: 99%
“…The compositions of Ta-Si-N thin films have been investigated extensively in the past twenty years [28][29][30][31][32][33][34]. Chung et al [28,[30][31][32]34] found that the microstructure and the possible compounds in Ta-Si-N thin films were sensitive to the process parameters. Different phases, such as, Ta 2 Si, Ta 5 Si 3 , Ta 2 N, TaN and/or Ta 1-x Si x N rather than a particular compound are usually formed.…”
Section: Resultsmentioning
confidence: 99%