2012
DOI: 10.1073/pnas.1014075109
|View full text |Cite
|
Sign up to set email alerts
|

Evaporation-induced cavitation in nanofluidic channels

Abstract: Cavitation, known as the formation of vapor bubbles when liquids are under tension, is of great interest both in condensed matter science as well as in diverse applications such as botany, hydraulic engineering, and medicine. Although widely studied in bulk and microscale-confined liquids, cavitation in the nanoscale is generally believed to be energetically unfavorable and has never been experimentally demonstrated. Here we report evaporation-induced cavitation in water-filled hydrophilic nanochannels under e… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
108
2

Year Published

2013
2013
2023
2023

Publication Types

Select...
6
1

Relationship

1
6

Authors

Journals

citations
Cited by 117 publications
(111 citation statements)
references
References 27 publications
1
108
2
Order By: Relevance
“…However, the comphant nature of the adhesive materials limits the aspect ratio compared to glass-glass or glass-silicon devices. The lowest previously reported aspect ratio for glassglass devices was 0.00025 [27], which is an order of magnitude lower than previously reported 0.005 for PDMS-glass devices [28].…”
Section: Introductionmentioning
confidence: 71%
See 3 more Smart Citations
“…However, the comphant nature of the adhesive materials limits the aspect ratio compared to glass-glass or glass-silicon devices. The lowest previously reported aspect ratio for glassglass devices was 0.00025 [27], which is an order of magnitude lower than previously reported 0.005 for PDMS-glass devices [28].…”
Section: Introductionmentioning
confidence: 71%
“…The measured depth of the nanochannels ranged from 16.0nm±0.1nm to 227nm±5nm. Therefore, aspect ratio for the bonded devices ranged from 0.0075 for 227 nm channels down to 0.0005 for 16 nm channels compared to previous lowest report of 0.005 using PDMS-stamp and stick bonding [28]. Design 2 featured a completely nanochannel network.…”
Section: Expérimentai Proceduresmentioning
confidence: 76%
See 2 more Smart Citations
“…The membranes were placed on a droplet (~7 μL) of the photoresist for 2 h to fill the nanopores and then baked on a hot plate at 100 °C for 50 min to evaporate the solvent. The photoresist was then etched by air plasma in a plasma cleaner (Harrick Plasma Inc.) 13 at 7.16 W and ~0.7 mTorr. The membranes were then briefly washed with an aqueous solution of 5wt% phosphoric acid for about 1 min, dried with nitrogen, and exposed to vapour of perfluorodecyltrichlorosilane (Gelest) overnight in a vacuum desiccator.…”
Section: Fabricationmentioning
confidence: 99%