Evaluation of thin film surface topology shapes

Vutova, Katia; Mladenov, G.; Tanaka, Takeshi; Kawabata, Ken‐ichi

doi:10.1016/s0378-4754(99)00044-0

Cited by 5 publications

(7 citation statements)

References 3 publications

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“…If one takes this geometrical aspect into account, the AR-XPS spectra can be analytically corrected to yield more realistic results, for example, relative depth profiles. [17] Obviously, the same procedure cannot be directly applied to tribological rough surfaces because a large number of different directions from overall the surface are blurring the spectra. [4] The present method based on an NURBS interpolation, however, properly accounts on a given level of accuracy for all topographical features of any tribological sample and accordingly simulates the AR-XPS spectra by neglecting the multiple scattering of electrons, but including the shadowing of photoelectrons as imposed by the roughness of the surface.…”

Section: Resultsmentioning

confidence: 99%

“…Considering the topography-induced shadowing of the photoelectrons, a methodology was developed by extending the method introduced by Vutova et al [17] First, one of the all known vertical sections of the linearly NURBS-interpolated periodical rough structure, for example, TGG or TGT, is considered. Second, the mesh points of the AFM image are used along the resulting profile line.…”

Section: Computational Detailsmentioning

confidence: 99%

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Effect of surface roughness on angle‐resolved XPS

Katona

Bianchi

Brenner

et al. 2012

Surface & Interface Analysis

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In the present contribution, the strategy of atomic force microscope mapping of periodical rough surfaces is combined with an extension of the polyhedral model. Atomic force microscope images are numerically interpolated, applying non-uniform rational B-splines, which also have the advantage that simultaneously to the interpolation, they provide the normals at any point on the rough surfaces. Compared with the polyhedral model, in the present scheme, any rough surface is accurately well approximated by a finite set of almost infinitesimal planes, which are all oriented in accordance with the normals obtained, while non-uniform rational B-splines interpolate the surface. In this view, the Beer-Lambert law is straightforwardly applied to compute all local (almost pointwise resolved) contributions to the photoelectron intensity on the analyser site. The proposed numerical scheme is validated in case of Si samples possessing either arbitrary rough, one-or two-dimensional periodic structures on the analysed surfaces. In this manner, it is shown that the computed angle-resolved XPS well agree with the experimental ones.

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Section: Resultsmentioning

confidence: 99%

Section: Computational Detailsmentioning

confidence: 99%

Effect of surface roughness on angle‐resolved XPS

Katona

Bianchi

Brenner

et al. 2012

Surface & Interface Analysis

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“…The most frequently published evidence is associated with XPS and ARXPS, [12][13][14][15][16][17][18][19][20][21][22][23][24][25][26] followed by AES, [27][28][29] REELS, 30,31 and EPES. [32][33][34][35] Below, several examples are mentioned for an illustration.…”

Section: ·1 Experimental Evidencementioning

confidence: 99%

Electron Spectroscopy of Corrugated Solid Surfaces

Zemek

2010

ANAL. SCI.

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This paper reviews work done of the influence of non-ideal surface topography on electron spectral intensities of surface-sensitive electron spectroscopic methods: primarily X-ray induced photoelectron spectroscopy (XPS) and concise Auger electron spectroscopy (AES), electron energy loss spectroscopy in the reflection mode (REELS), and elastic peak electron spectroscopy (EPES). Several attempts to solve the problem are mentioned, where (i) the effect of surface roughness is corrected using a single parameter, (ii) computer simulations based on a model of surface roughness composed of regular geometrical units are used for electron spectral intensity calculations, and finally, (iii) a semi-empirical method based on careful surface mapping of analyzed sample by atomic force microscopy (AFM) is discussed in greater detail. The first approach was found to be rather simple to properly include any complex surface topography. The second technique can help us to understand surface topography related phenomena. The latter method, suitable for arbitrary rough solid surfaces covered by conformal overlayer(s), can be incorporated in current quantitative procedures valid for ideally flat surfaces.

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“…Our model uses triangular prisms to approximate the sample's textured surface topology when the substrate is covered by a layer of thickness d. A similar model was used to approximate the surface roughness in the case of a thick sample of uniform material composition. 7,8 We denote the prism slope angle by˛, representing the roughness (Fig. 1).…”

Section: Photoelectron Intensity In the Case Of Textured Overlayer Samentioning

confidence: 99%

“…7,8 The proposed model calculates XPS angular intensity distributions of the ejected photoelectrons from the covering layer material, in the case of the textured overlayer samples, using the following assumptions: the substrate is covered with a single uniform surface layer; the ejected photoelectrons have straight-line trajectories; and the elastic energy losses are neglected.…”

Section: Introductionmentioning

confidence: 99%