2007
DOI: 10.1016/j.jaerosci.2006.11.010
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Evaluation of protection schemes for extreme ultraviolet lithography (EUVL) masks against top–down aerosol flow

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Cited by 35 publications
(27 citation statements)
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“…Deposition velocity, defined as the ratio of particle flux toward a surface to aerosol concentration above that surface, is accepted as the criterion to assess the level of particulate contamination. Previous researches of deposition velocity have focused on the horizontal free-standing wafer to which air flow is perpendicular (Liu and Ahn 1987;Opiolka et al 1994;Otani et al 1989;Pui et al 1990;Ye et al 1991;Yook et al 2007b). Since horizontal wafers or photomasks are transported horizontally by robots in the cleanroom, aerosol particles may approach and contaminate the wafers or photomasks by the air flow parallel to the surfaces.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Deposition velocity, defined as the ratio of particle flux toward a surface to aerosol concentration above that surface, is accepted as the criterion to assess the level of particulate contamination. Previous researches of deposition velocity have focused on the horizontal free-standing wafer to which air flow is perpendicular (Liu and Ahn 1987;Opiolka et al 1994;Otani et al 1989;Pui et al 1990;Ye et al 1991;Yook et al 2007b). Since horizontal wafers or photomasks are transported horizontally by robots in the cleanroom, aerosol particles may approach and contaminate the wafers or photomasks by the air flow parallel to the surfaces.…”
Section: Introductionmentioning
confidence: 99%
“…One of the schemes to minimize particulate contamination of EUVL photomasks is the use of the gravity by letting the critical surfaces facing down (Asbach et al 2006;Yook et al 2007bYook et al , 2007c. It is thus helpful to render the critical surfaces of wafers or photomasks facing-down even at the stages of transporting them by robots.…”
Section: Introductionmentioning
confidence: 99%
“…Deposition velocity, which is the ratio of particle flux towards a surface to aerosol concentration above the surface, is used as a measure of particulate contamination level. Many investigations were performed to predict deposition velocity onto a free-standing wafer in an air flow perpendicular to the wafer surface, considering top-down air flow from ceiling in a clean room (Liu & Ahn, 1987;Opiolka, Schmidt, & Fissan, 1994;Otani, Emi, Kanaoka, and Kato, 1989;Pui, Ye, and Liu, 1990;Ye et al, 1991;Yook et al, 2007a).…”
Section: Introductionmentioning
confidence: 99%
“…Once the particle hit any walls including the impaction plate, the particle was assumed to be trapped. In order to calculate the collection efficiency of inertial impactors, the Statistical Lagrangian Particle Tracking (SLPT) model, developed by Yook et al (2007), was employed and adjusted. Fig.…”
Section: Calculation Of Impactor Collection Efficiencymentioning
confidence: 99%