“…Deposition velocity, which is the ratio of particle flux towards a surface to aerosol concentration above the surface, is used as a measure of particulate contamination level. Many investigations were performed to predict deposition velocity onto a free-standing wafer in an air flow perpendicular to the wafer surface, considering top-down air flow from ceiling in a clean room (Liu & Ahn, 1987;Opiolka, Schmidt, & Fissan, 1994;Otani, Emi, Kanaoka, and Kato, 1989;Pui, Ye, and Liu, 1990;Ye et al, 1991;Yook et al, 2007a).…”