2012
DOI: 10.7735/ksmte.2012.21.2.267
|View full text |Cite
|
Sign up to set email alerts
|

Evaluation of Material Properties in Austenite Stainless Steel Sheet with Scanning Acoustic Microscopy

Abstract: Austenite stainless steel 304 has properties of high resistance to corrosion and temperature changes. Therefore, this material is widely used in various of industries. However, when the material is subjected to heating and cooling cycles the forming accuracy, for example, the right angle associated with a sharp bend such as corner is lost. This phenomenon is caused by the reversion of the deformation-induced martensite into austenite when the temperature in increased. This result in misfit of a structure or an… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2023
2023
2023
2023

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 11 publications
(4 reference statements)
0
1
0
Order By: Relevance
“…Thus, a technique that can precisely evaluate the surface, surface layer, and interface characteristics is required. The nondestructive evaluation (NDE) that utilizes ultrasonic waves is the only technique that can evaluate the surface and interface characteristics of thin film structures [ 7 , 8 , 9 , 10 , 11 , 12 ]. With the increased applications of acoustic microscopy, it was not difficult to inspect the inside of the past semiconductors using 15–100 MHz ultrasonic waves because their total thickness exceeded 3 mm and the thickness of the silicon die inside them was more than 1 mm [ 13 , 14 ].…”
Section: Introductionmentioning
confidence: 99%
“…Thus, a technique that can precisely evaluate the surface, surface layer, and interface characteristics is required. The nondestructive evaluation (NDE) that utilizes ultrasonic waves is the only technique that can evaluate the surface and interface characteristics of thin film structures [ 7 , 8 , 9 , 10 , 11 , 12 ]. With the increased applications of acoustic microscopy, it was not difficult to inspect the inside of the past semiconductors using 15–100 MHz ultrasonic waves because their total thickness exceeded 3 mm and the thickness of the silicon die inside them was more than 1 mm [ 13 , 14 ].…”
Section: Introductionmentioning
confidence: 99%