Evaluating Al2O3 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniques

Abstract

Articles you may be interested inCritical tensile strain and water vapor transmission rate for nanolaminate films grown using Al2O3 atomic layer deposition and alucone molecular layer deposition

Extremely High Barrier Performance of Organic–Inorganic Nanolaminated Thin Films for Organic Light-Emitting Diodes

“…Most importantly, films based on MLD/ALD contain a limited number of pinholes, and the individual deposition processes can be easily combined because they can be carried out in the same reaction chamber. Most hybrid nanolaminated barrier thin films deposited by MLD/ALD technologies have used an organic nanolayer called alucone and various oxide materials (e.g., Al 2 O 3 , TiO 2 /Al 2 O 3 , and ZrO 2 /Al 2 O 3 ) as inorganic nanolayers. ,− However, as was also demonstrated by the previous studies, − our preliminary study revealed that these hybrid nanolaminates do not show adequate barrier performance due to the poor air-stability of alucone. , Recently, alkylsiloxane self-assembled monolayers (SAMs) were used to fabricate hybrid nanolaminated barrier thin films using MLD/ALD-based TiO 2 . SAMs were deposited using MLD with a Ti-linker at 150 °C and served as stable decoupler layers.…”

A monolithic integration of robust, water-/oil-repellent layer onto multilayer encapsulation films for organic electronic devices

“…In order to measure the water vapor and oxygen barrier performance of the water-/oil-repellent multilayer TFE, a Ca test was carried out, according to the method proposed by Bertrand et al 39 Fig. 5(a) shows the result of the WVTR measurement.…”

Synergy Between Plasma‐Assisted ALD and Roll‐to‐Roll Atmospheric Pressure PE‐CVD Processing of Moisture Barrier Films on Polymers

“…The WVTR barrier degradation may be related to the Al 2 O 3 hydrolysis effect. [13] At an Al 2 O 3 layer thickness of ~ 20 nm (150 ALD cycles), the barrier performance is independent of the substrate. This phenomenon was not observed for the barriers deposited on the silica-like buffer layer described above.…”