EUV light source by high power laser

Izawa, Yasukazu; Nishihara, Katsunobu; Tanuma, H.; Sasaki, Akira; Murakami, M.; Sunahara, A.; Nishimura, Hiroaki; Fujioka, Shinsuke; Aota, Tatsuya; Shimada, Yusuke; Yamaura, Michiteru; Nakatsuka, Masahiro; Fujita, Hisanori; Tsubakimoto, Koji; Yoshida, Hidetsugu; Miyanaga, Noriaki; Mima, K.

doi:10.1088/1742-6596/112/4/042047

Cited by 8 publications

(5 citation statements)

References 9 publications

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“…The densities above 10 18 cm −3 are not expedient for EUV light generation, at least for the typical example of a discharge with characteristic dimensions of about 100 µm considered. A similar result was obtained independently for laser-produced plasma by Izawa et al [31], who studied 13.5±1% nm radiation sources based on tin-droplet evaporation. Thus, our conclusion on the upper limit for density, related to EUV light trapping, seems to be general.…”

Section: Atomic Data For Xenonsupporting

confidence: 85%

Extreme-Ultraviolet Light Source for Lithography Based on an Expanding Jet of Dense Xenon Plasma Supported by Microwaves

Abramov¹,

Gospodchikov²,

Shalashov³

2018

Phys. Rev. Applied

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We discuss a concept of a pointlike source of extreme-ultraviolet (EUV) light based on a nonequilibrium microwave discharge in an expanding jet of dense xenon plasma with multiply charged ions. The conversion efficiency of microwave radiation to EUV light is calculated, and physical constraints and opportunities for future devices are considered. Special attention is given to trapping of spontaneous line emission inside a radiating plasma spot that significantly influences the efficiency of an EUV light source.

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Section: Atomic Data For Xenonsupporting

confidence: 85%

Extreme-Ultraviolet Light Source for Lithography Based on an Expanding Jet of Dense Xenon Plasma Supported by Microwaves

Abramov¹,

Gospodchikov²,

Shalashov³

2018

Phys. Rev. Applied

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“…Laser-produced tin plasmas and gas-discharge xenon plasmas have been widely investigated because their compactness and high emissivity around 13.5 nm make them an attractive extreme ultraviolet light (EUV) source. [1][2][3][4][5] In previous studies, tin spectra in the 13.5 nm region show a complicated spectral profile with a broad reabsorption band and several pronounced dips. The true spectral profiles of tin ions in optically thick plasmas are distorted to yield the observed profile by self-absorption features owing to the opacity effect.…”

Section: Introductionmentioning

confidence: 91%

Analysis of extreme ultraviolet spectral profiles of laser-produced Cr plasmas*

Qin

et al. 2019

Chinese Phys. B

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Radiation from laser-produced plasmas was examined as a potential wavelength calibration source for spectrographs in the extreme ultraviolet (EUV) region. Specifically, the EUV emission of chromium (Cr) plasmas was acquired via spatio-temporally resolved emission spectroscopy. With the aid of Cowan and flexible atomic code (FAC) structure calculations, and a comparative analysis with the simulated spectra, emission peaks in the 6.5–15.0 nm range were identified as 3p–4d, 5d and 3p–4s transition lines from Cr5+–Cr10+ ions. A normalized Boltzmann distribution among the excited states and a steady-state collisional-radiative model were assumed for the spectral simulations, and used to estimate the electron temperature and density in the plasma. The results indicate that several relatively isolated emission lines of highly charged ions would be useful for EUV wavelength calibration.

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“…The higher the photon energy is required the higher the plasma temperature and the laser intensity or the pulsed-power should be used. Laser-produced plasma (LPP) is derived through an interaction of focused single or multiple laser pulses (of the same or different wavelengths) with a solid or liquid target [1,2], or gas-puff target [3,4] in a vacuum chamber; for discharge-produced plasma (DPP), it is an electric discharge in a capillary filled with a gas mixture [5,6] or vacuum arc [7]. To the best of our knowledge, the only way to use the discharge technique with solid or liquid targets to obtain ionized plasma is with the combined approach: initially a laser pulse vaporizes and preionizes the target, setting up an arc discharge as the main driver of plasma heating [7][8][9].…”

Section: Introductionmentioning

confidence: 99%

Influence of CO₂-laser pulse parameters on 13.5 nm extreme ultraviolet emission features from irradiated liquid tin target

Zakharov¹,

Wang²,

Захаров³

et al. 2022

J. Phys. D: Appl. Phys.

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A laser-produced plasma (LPP) excited by CO2 laser pulses with various durations and energies on liquid tin droplets with diameters of 150 μm and 180 μm is considered. A two-dimensional radiative-magnetohydrodynamic (RMHD) code is used for numerical simulations of multicharged ion plasma radiation and dynamics. The code permits to understand the plasma dynamics self-consistent with radiation transport in non-local equilibrium (nonLTE) multicharged ion plasma. Results of simulations for various laser pulse durations and 75÷600 mJ pulse energies with both Gaussian and experimentally taken temporal profiles are discussed. It is found that if the mass of the target is big enough to provide the plasma flux required (the considered case) a kind of dynamic quasi-stationary plasma flux is formed. In this dynamic quasi-stationary plasma flux, an interlayer of relatively cold tin vapor with mass density of 1÷2 g/cm3 is formed between the liquid tin droplet and low density plasma of the critical layer. Expanding of the tin vapor from the droplet provides the plasma flux to the critical layer. In critical layer the plasma is heated up and expands faster. In the simulation results with spherical liquid tin target, the CE into 2π is of 4% for 30 ns FWHM and just slightly lower - of 3.67% for 240 ns FWHM for equal laser intensities of 14 GW/cm2. This slight decay of the in-band EUV yield with laser pulse duration is conditioned by an increasing of radiation re-absorption by expanding plasma from the target, as more cold plasma is produced with longer pulse. The calculated angular distributions of in-band EUV emission permit to optimize a collector configuration.

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EUV light source by high power laser

Cited by 8 publications

References 9 publications

Extreme-Ultraviolet Light Source for Lithography Based on an Expanding Jet of Dense Xenon Plasma Supported by Microwaves

Extreme-Ultraviolet Light Source for Lithography Based on an Expanding Jet of Dense Xenon Plasma Supported by Microwaves

Analysis of extreme ultraviolet spectral profiles of laser-produced Cr plasmas*

Influence of CO₂-laser pulse parameters on 13.5 nm extreme ultraviolet emission features from irradiated liquid tin target

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EUV light source by high power laser

Cited by 8 publications

References 9 publications

Extreme-Ultraviolet Light Source for Lithography Based on an Expanding Jet of Dense Xenon Plasma Supported by Microwaves

Extreme-Ultraviolet Light Source for Lithography Based on an Expanding Jet of Dense Xenon Plasma Supported by Microwaves

Analysis of extreme ultraviolet spectral profiles of laser-produced Cr plasmas*

Influence of CO2-laser pulse parameters on 13.5 nm extreme ultraviolet emission features from irradiated liquid tin target

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Influence of CO₂-laser pulse parameters on 13.5 nm extreme ultraviolet emission features from irradiated liquid tin target