2016
DOI: 10.1016/j.vacuum.2016.03.016
|View full text |Cite
|
Sign up to set email alerts
|

Ethanol sensing properties of hierarchical SnO2 fibers fabricated with electrospun polyvinylpyrrolidone template

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
14
0

Year Published

2017
2017
2024
2024

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 23 publications
(14 citation statements)
references
References 28 publications
0
14
0
Order By: Relevance
“…Fan et al [ 76 ] developed a new fabrication strategy for synthesis of SnO 2 NFs with a branch-on-stem morphology using electrospinning, oxygen plasma etching, sputtering and annealing. Electrospun PVP NFs were first etched with oxygen plasma to make a hierarchical template.…”
Section: Reviewmentioning
confidence: 99%
See 2 more Smart Citations
“…Fan et al [ 76 ] developed a new fabrication strategy for synthesis of SnO 2 NFs with a branch-on-stem morphology using electrospinning, oxygen plasma etching, sputtering and annealing. Electrospun PVP NFs were first etched with oxygen plasma to make a hierarchical template.…”
Section: Reviewmentioning
confidence: 99%
“…4.1.1 Pure semiconducting metal oxides: Several types of electrospun metal oxide (MOx) semiconductors have been used for gas sensing applications. These semiconductors include titanium dioxide (TiO 2 ) [ 93 95 ], tungsten trioxide (WO 3 ) [ 27 , 96 110 ], copper oxide (CuO) [ 111 ], NiO [ 112 ], Co 3 O 4 [ 113 – 114 ], iron oxide (Fe 2 O 3 ) [ 115 – 116 ], tin dioxide (SnO 2 ) [ 76 , 117 123 ], zinc oxide (ZnO) [ 124 130 ], and indium oxide (In 2 O 3 ) [ 78 , 80 , 131 138 ]. Table S2 in Supporting Information File 1 summarizes the sensing performance of these electrospun pure MOx nanofibers.…”
Section: Reviewmentioning
confidence: 99%
See 1 more Smart Citation
“…SEM micrographs of SnO 2 NFs modified by plasma etching and sputtering process at different conditions to achieve hierarchical NFs are presented in Figure 12 [116]. …”
Section: Fabrication Of Electrospun Ceramic Matsmentioning
confidence: 99%
“…( a ) plasma etching time of 30 s and sputtering time of 190 s; and ( b ) plasma etching time of 30 s and sputtering time of 480 s. Reprinted with permission from Ref. [116]. Copyright © 2016 Elsevier Ltd.…”
Section: Figurementioning
confidence: 99%