Etching of polycrystalline diamond films by electron beam assisted plasma

Kobashi, Koji; Miyauchi, Shigeaki; Miyata, Kouji; Nishimura, K.; Rocca, J. J.

doi:10.1557/jmr.1996.0348

Cited by 6 publications

(4 citation statements)

References 23 publications

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“…Oxidizing gas assisted FEBID was already reported to lead to increase of gold contents, and to pure stoichiometric silica films. [7][8][9][10][11][12] It is highly motivating and challenging to study if adding O 2 or H 2 , known to etch carbon under FEBs, 13,14 to precursor vapors of a less noble metal leads to the FEBID of higher metal content materials, as a function of the precursor chemistry.…”

Section: Introductionmentioning

confidence: 99%

Focused electron beam induced deposition of nickel

Perentes

Sinicco

Boero

et al. 2007

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Electron postgrowth irradiation of platinum-containing nanostructures grown by electron-beam-induced deposition from Pt ( P F 3 ) 4Investigation of morphological changes in platinum-containing nanostructures created by electron-beam-induced deposition J.Focused electron beam induced depositions of nickel-containing materials obtained by using bis͑methylcyclopentadienyl͒nickel͑II͒ Ni͑C 5 H 4 CH 3 ͒ 2 and tetrakis͑trifluorophosphine͒nickel͑0͒ Ni͑PF 3 ͒ 4 as precursors, were compared in terms of chemical composition and electrical resistivity. Ni͑PF 3 ͒ 4 decomposed into higher Ni content materials than that obtained with Ni͑C 5 H 4 CH 3 ͒ 2 ͑typically 40 and 10 at. %, respectively͒. Attempts of increasing the Ni content by injecting controlled flows of molecular oxygen or hydrogen simultaneously to the precursor vapors resulted in all cases in the increase of incorporated oxygen only. The lowest electrical resistivities of 150 nm wide lines obtained from Ni͑C 5 H 4 CH 3 ͒ 2 and Ni͑PF 3 ͒ 4 were 1 and 1 ϫ 10 −3 ⍀ cm, respectively. The electrical resistivity of the latter lines showed an e ͑−T͒ dependence with temperature, typical of magnetic heterogeneous alloys and granular alloys containing insulating particles. Transmission electron microscopy investigations of a freestanding rod obtained from Ni͑PF 3 ͒ 4 showed a nanocrystalline structure of nickel grains surrounded by a partially amorphous cladding.

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Section: Introductionmentioning

confidence: 99%

Focused electron beam induced deposition of nickel

Perentes

Sinicco

Boero

et al. 2007

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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“…Several types of cold cathode glow discharges have been utilized to produce pulsed [1]- [4] as well as CW electron beams [5], [6]. The beams produced by these discharges have been used for various materials processing applications, including annealing [7]- [9], thin film deposition [10]- [12], and the etching of diamond films [13]. Recently, Mingolo et al [14] applied a cold cathode electron gun to the amorphization of Mg-Zn alloys.…”

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confidence: 99%

A simple model of a glow discharge electron beam for materials processing

Etcheverry

Míngolo

Rocca

et al. 1997

IEEE Trans. Plasma Sci.

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Abstract-A simple semiempirical model of the electron beam generated by a pulsed cold cathode electron gun has been developed. The model describes analytically the observed self-focusing of the discharge and predicts the dynamical variation of the focal distance, in good agreement with experiments. This effect plays a major role in the determination of the effective duration of the energy pulse. The model was used to conduct simple calculations of energy thresholds for melting of solid materials, giving helpful insight on ranges of operation of this kind of electron gun for its application to material processing. A comparison with available experimental data for Mg 70 Zn 30 samples is given.

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“…This mechanism is in contrast with the case of a flat cathode, in which the focusing is exclusively caused by the self-generated magnetic field. This cathode geometry was previously used for low-current continuos wave discharges by Rocca et al [20], [21] in situations in which the magnetic force could not provide enough focusing action. In the curved cathode pulsed discharge, the magnetic focusing is still present, and the spot size at the sample results from the combined action of both mechanisms.…”

Section: Introductionmentioning

confidence: 99%

Enhanced energy deposition efficiency of glow discharge electron beams for metal surface treatment

Míngolo

Cesa

Martı́nez

et al. 2000

IEEE Trans. Plasma Sci.

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Abstract-The energy deposition efficiency and focal spot dynamics of electron beams produced by pulsed cold-cathode highvoltage glow discharges for metal surface treatment are investigated for two different cathode geometries. A concave cathode geometry in which the focusing is dominated by the convergence of the electric field lines in the cathode fall region is compared with a flat cathode in which the focusing is exclusively caused by the self-generated magnetic field. Results of the treatment of AISI 4140 carbon steel samples show that the concave cathode geometry significantly increases the efficiency, reduces the threshold power necessary for melting, and is less sensitive to variations in the discharge parameters and sample position. The results of numerical modeling indicate that the observed increase in efficiency is caused by the longer persistence of the focal spot on the sample. The model can be used to predict the discharge parameters required for a desired treatment.

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Etching of polycrystalline diamond films by electron beam assisted plasma

Cited by 6 publications

References 23 publications

Focused electron beam induced deposition of nickel

Focused electron beam induced deposition of nickel

A simple model of a glow discharge electron beam for materials processing

Enhanced energy deposition efficiency of glow discharge electron beams for metal surface treatment

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