Etching characteristics of fine Ta patterns with electron cyclotron resonance chlorine plasma

Fabrication of Highly ordered pore arrays by soft nanoimprint lithography

“…The commonly used technique for the fabrication of the highly ordered pore arrays is based on electron-beam lithography(EBL)I8" Although EBL can produce highly ordered pore arrays, it is an expensive and inefficient technology. Nanoimprint lithography (NIL) is considered as a low-cost fabrication process for photonic devices [9][10][11][12] In this work, we employed EBL and NIL technology fabricating the nanoscale pore arrays.…”