etching by<b><i>M</i></b>= 0 helicon plasma

Nogami, Hiroshi; Ogahara, Y.; Mashimo, Kimiko; Nakagawa, Yukito; Tsukada, Tsutomu

doi:10.1088/0963-0252/5/2/010

Cited by 10 publications

(9 citation statements)

References 15 publications

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“…Hollenstein et al [12] suggest that particulate formation can be suppressed by pulsing the discharge periodically to remove negatively charged particle precursors, such as high-molecular-weight negative ions. Nogami et al [13] observed the same SiO 2 etching rate for pulsed and CW discharges with the same average power.…”

Section: Introductionmentioning

confidence: 79%

“…The last equality in (13) defines an effective discharge size l eff . Equation (13) determines T e for a given gas pressure and discharge geometry (R and L).…”

Section: The Steady State Modelmentioning

confidence: 99%

“…The last equality in (13) defines an effective discharge size l eff . Equation (13) determines T e for a given gas pressure and discharge geometry (R and L). It is convenient to define a collisional energy loss per electron-ion pair created, E c , by…”

Section: The Steady State Modelmentioning

confidence: 99%

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Global models of pulse-power-modulated high-density, low-pressure discharges

Lieberman

Ashida

1996

Plasma Sources Sci. Technol.

243

170

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Global (volume-averaged) models of high-density, low-pressure electropositive and electronegative discharges are described both for continuous wave (CW) and for pulsed-power excitation. Argon and chlorine discharges are treated. The particle and energy balance equations are applied to determine the charged particle and neutral dynamics. For argon just after the power has been turned on, the analysis shows an initial very sharp rise in electron temperature T e , followed by a decay of T e and an increase in the electron density n e to steady state values during the pulse-on time. Just after the power has been turned off, T e decays rapidly and n e decays more slowly. The time-average n e can be considerably higher than that for CW discharges for the same time-average power. For chlorine, a CW discharge is highly dissociated and the negative ion density n Cl − is lower than n e . For a pulsed discharge, the initial rise and subsequent decay of n Cl − just after the power has been turned off are determined analytically. A pulsed discharge can have the same neutral radical (Cl) flux to the walls for a reduced average power. The analytical models are compared to more complete global model simulations and to experimental observations. We find that global models can provide considerable insight into the discharge dynamics.

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Section: Introductionmentioning

confidence: 79%

“…The last equality in (13) defines an effective discharge size l eff . Equation (13) determines T e for a given gas pressure and discharge geometry (R and L).…”

Section: The Steady State Modelmentioning

confidence: 99%

See 1 more Smart Citation

Global models of pulse-power-modulated high-density, low-pressure discharges

Lieberman

Ashida

1996

Plasma Sources Sci. Technol.

243

170

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“…The magnetic coils generate the magnetic field for the helicon wave to propagate in the plasma. The magnet arrays on the wall of the diffusion chamber prevent plasma losses at the wall, after[22].…”

mentioning

confidence: 99%

Plasma generation and plasma sources

Conrads

Schmidt

2000

Plasma Sources Sci. Technol.

647

380

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This paper reviews the most commonly used methods for the generation of plasmas with special emphasis on non-thermal, low-temperature plasmas for technological applications. We also discuss various technical realizations of plasma sources for selected applications. This paper is further limited to the discussion of plasma generation methods that employ electric fields. The various plasmas described include dc glow discharges, either operated continuously (CW) or pulsed, capacitively and inductively coupled rf discharges, helicon discharges, and microwave discharges. Various examples of technical realizations of plasmas in closed structures (cavities), in open structures (surfatron, planar plasma source), and in magnetic fields (electron cyclotron resonance sources) are discussed in detail. Finally, we mention dielectric barrier discharges as convenient sources of non-thermal plasmas at high pressures (up to atmospheric pressure) and beam-produced plasmas. It is the main objective of this paper to give an overview of the wide range of diverse plasma generation methods and plasma sources and highlight the broad spectrum of plasma properties which, in turn, lead to a wide range of diverse technological and technical applications.

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“…The proposed configuration can be used to enable effective control of the ion fluxes extracted from vacuum arc guns and unbalanced magnetrons that produce metal ions, and from the wave-driven (e.g., ECR or helicon) plasma sources that produce gaseous ions. [33][34][35] …”

Section: Introductionmentioning

confidence: 99%

Control of ion density distribution by magnetic traps for plasma electrons

Baranov

Romanov

Fang

et al. 2012

Journal of Applied Physics

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The effect of a magnetic field of two magnetic coils on the ion current density distribution in the setup for low-temperature plasma deposition is investigated. The substrate of 400 mm diameter is placed at a distance of 325 mm from the plasma duct exit, with the two magnetic coils mounted symmetrically under the substrate at a distance of 140 mm relative to the substrate centre. A planar probe is used to measure the ion current density distribution along the plasma flux cross-sections at distances of 150, 230, and 325 mm from the plasma duct exit. It is shown that the magnetic field strongly affects the ion current density distribution. Transparent plastic films are used to investigate qualitatively the ion density distribution profiles and the effect of the magnetic field. A theoretical model is developed to describe the interaction of the ion fluxes with the negative space charge regions associated with the magnetic trapping of the plasma electrons. Theoretical results are compared with the experimental measurements, and a reasonable agreement is demonstrated.

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etching byM= 0 helicon plasma

Cited by 10 publications

References 15 publications

Global models of pulse-power-modulated high-density, low-pressure discharges

Global models of pulse-power-modulated high-density, low-pressure discharges

Plasma generation and plasma sources

Control of ion density distribution by magnetic traps for plasma electrons

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