Estimation of moisture barrier ability of thin SiNx single layer on polymer substrates prepared by Cat-CVD method

Saitoh, K.; Kumar, Rajesh; Chua, Soo-Jin; Masuda, Atsushi; Matsumura, Hideki

doi:10.1016/j.tsf.2007.06.215

Cited by 14 publications

(6 citation statements)

References 3 publications

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“…However, many Ca test configurations do have small accumulation volumes and should achieve steady state in reasonable times. For the WVTR measurements performed with the Ca film deposited directly on the polymer, ,,,,, there is no accumulation volume and there should not be a problem with long lag times. However, these WVTR measurements may still observe the effects of nonlinear Ca film oxidation kinetics.…”

Section: Wvtr Measurements With Water Vapor Accumulationmentioning

confidence: 99%

Oxidation Kinetics of Calcium Films by Water Vapor and Their Effect on Water Vapor Transmission Rate Measurements

et al. 2014

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The oxidation of calcium films by water vapor is the basis of the “Ca test” used to measure low water vapor transmission rates (WVTRs) through gas diffusion barriers. The Ca test assumes that the Ca film oxidation rate is linear with H2O flux transmitted through the barrier. However, lag times are often observed during WVTR measurements that could indicate that the Ca film oxidation rate is not linear with H2O flux. To explore the oxidation kinetics of Ca films by H2O vapor, a new Ca test was developed based on quartz crystal microbalance (QCM) measurements. The QCM measures the mass gain that occurs as the Ca film oxidizes according to the reaction: Ca + 2H2O → Ca(OH)2 + H2. The QCM measurements observed a long lag time before the Ca films began to oxidize. The Ca film oxidation was studied using a number of experimental configurations. In all cases, the Ca film oxidation was not linear with H2O flux to the Ca film. These results suggest that the nonlinearity of Ca film oxidation in many WVTR experiments may result from the nonlinear oxidation of the Ca film itself. Additional measurements of the times required for complete Ca film oxidation versus H2O flux at constant temperatures were consistent with oxidation kinetics that were second-order in H2O flux. The nonlinear Ca film oxidation raises doubts about the validity of WVTR measurements using the Ca test. However, modeling based on the measured nonlinear Ca film oxidation kinetics suggests that the Ca test can yield reliable WVTR measurements under special circumstances. These circumstances occur when the accumulation volume between the barrier and the Ca film is small enough to allow for steady state pressure conditions where the H2O flux transmitted through the barrier is equivalent to the H2O flux removed by oxidation of the Ca film. The lag time is associated with the time required to obtain the steady state pressure in the accumulation volume.

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Section: Wvtr Measurements With Water Vapor Accumulationmentioning

confidence: 99%

Oxidation Kinetics of Calcium Films by Water Vapor and Their Effect on Water Vapor Transmission Rate Measurements

et al. 2014

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“…Many temperatures and relative humidities have been employed such as 20 C/60% RH; 30,31 25 C/50% RH; 13 25 C/40% RH; 33,34 38 C/85% RH; 12 38 C/90% RH; 4 39 C/95% RH; 6 40 C/ 90% RH; 35 45 C/85% RH; 32 60 C/85% RH; 12 85 C/50% RH; 5 and 85 C/85% RH. 32 This summary indicates that there are no standard conditions employed to measure WVTR values using the Ca test.…”

Section: A Wvtr Measurements Using the Ca Testmentioning

confidence: 99%

“…26,37 Depositing the Al 2 O 3 ALD film directly on the Ca film also is similar to experiments where the Ca film is deposited on a polymer substrate and the barrier is deposited on the other side. 6,[33][34][35] In this case, the Ca degradation can identify the location of the defect in the barrier on the other side of the polymer. Other studies have also recently been developed to view individual defects in Al 2 O 3 ALD films using copper electroplating or fluorescent tagging.…”

Section: B Nature Of Pinhole Defects Observed By Ca Testmentioning

confidence: 99%

Evaluating Al2O3 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniques

Bertrand

George

2012

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…Many applications are possible for SiN x . This material has been demonstrated as encapsulation barrier against H 2 O and O 2 (even on top of sensitive organic layers) [33], as passivating dielectric in AlGaN/GaN high mobility field effect transistors [34], as a mechanically strong material for microelectromechanical structures (MEMS) [35], as the gate dielectric in thin film transistors (TFTs) [15], and as a passivating antireflective layer on polycrystalline solar cells [13,42]. This section shows the recent progress on the application of SiN x :H and a-Si:H deposited at high Hot-Wire deposition rates for deposited thin film transistors (TFTs).…”

Section: High Deposition Rate Silicon Nitridementioning

confidence: 99%

Hot Wire Chemical Vapor Deposition: Recent Progress, Present State of the Art and Competitive Opportunities

Schropp

2009

ECS Trans.

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Hot Wire CVD (also called Catalytic CVD or initiated CVD) is an elegant low pressure deposition technique for the deposition of functional films, both inorganic and organic, based on the decomposition of precursor sources at a heated metallic surface. The conformal deposition of thin films on rigid substrates or flexible foil substrates, whether in-line or batch type, is very straightforward, since it is plasma-free (i.e. without the risk of a damaging bombardment of energetic ions) and it is easily scalable. An increasing variety of thin film materials can be obtained with this method, with good feedstock gas utilization and high deposition rate. Progress has been made in establishing stable and reproducible conditions for the hot catalytic wires used for efficient decomposition of the source gases. In this paper we discuss some of the current research issues in this field.

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Estimation of moisture barrier ability of thin SiNx single layer on polymer substrates prepared by Cat-CVD method

Cited by 14 publications

References 3 publications

Oxidation Kinetics of Calcium Films by Water Vapor and Their Effect on Water Vapor Transmission Rate Measurements

Oxidation Kinetics of Calcium Films by Water Vapor and Their Effect on Water Vapor Transmission Rate Measurements

Evaluating Al2O3 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniques

Hot Wire Chemical Vapor Deposition: Recent Progress, Present State of the Art and Competitive Opportunities

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