Error correction for calibration and data reduction in rotating-polarizer ellipsometry: applications to a novel multichannel ellipsometer

Nguyen, Nghia Van; Pudliner, B. S.; An, Ilsin; Collins, R. W.

doi:10.1364/josaa.8.000919

Cited by 51 publications

(20 citation statements)

References 18 publications

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“…In addition, we highlight various improvements in error correction established since the previous reports. 9,19 First, in Sec. III A the basic mode of data collection will be reviewed for an ideal ͑error-free͒ system.…”

Section: Instrument Theory and Operationmentioning

confidence: 86%

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Multichannel ellipsometer for real time spectroscopy of thin film deposition from 1.5 to 6.5 eV

Zapien

Collins

Messier

2000

Review of Scientific Instruments

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A rotating polarizer multichannel ellipsometer has been optimized for operation well into the ultraviolet (UV) spectral range. With this instrument, 132 spectral points in the ellipsometric parameters (ψ, Δ) over the photon energy range from 1.5 eV (827 nm) to 6.5 eV (191 nm) can be collected in a minimum acquisition time of 24.5 ms, corresponding to one optical cycle of the rotating polarizer. Averages over two and 80 optical cycles (obtained in 49 ms and 1.96 s, respectively) give standard deviations in (ψ, Δ) of less than (0.04°, 0.08°) and (0.007°, 0.015°), respectively, for the energy range from 3.5 to 6.0 eV, as determined from successive measurements of a stable thermally oxidized silicon wafer. Key modifications to previous instrument designs include: (i) a tandem in-line Xe/D2 source configuration for usable spectral output from 1.5 to 6.5 eV; (ii) MgF2 Rochon polarizers for high transmission in the UV without the need for optical activity corrections; (iii) a spectrograph with a grating blazed at 250 nm and two stages of internally mounted order-sorting filters; and (iv) nonuniform grouping of the pixels of the photodiode array detector for a more uniform spectral resolution versus photon energy, with energy spreads per pixel group ranging from 0.02 eV at 1.6 eV to 0.05 eV at 5.1 eV. As an example of the application of this instrument, results of real time spectroscopic ellipsometry studies are reported for the deposition of an amorphous silicon nitride thin film by radio-frequency magnetron sputtering onto a silicon wafer substrate.

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Section: Instrument Theory and Operationmentioning

confidence: 86%

“…19 Here, we emphasize detection system error correction, instrument calibration, and data reduction as it relates to the performance of the instrument at high energy. In addition, we highlight various improvements in error correction established since the previous reports.…”

Section: Instrument Theory and Operationmentioning

confidence: 99%

Multichannel ellipsometer for real time spectroscopy of thin film deposition from 1.5 to 6.5 eV

Zapien

Collins

Messier

2000

Review of Scientific Instruments

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“…A series of calibration was performed according to the procedures described in detail by Collins et al, [23][24][25][26] Russev,27 and Johs. 28 It was found that the number of counts from all pixels changes quite linearly with exposure time, indicating the nonlinearity of the detector is negligibly small.…”

Section: Methodsmentioning

confidence: 99%

“…27 were 0.01 and Ϫ0.01, respectively, and almost independent of pixel number in the range of 173-512. The correction parameters for residual source polarization, ␥ Sc and ␥ Ss , 24,26 are in the range of 0.003-0.009, and are slightly dependent on pixel number. The optical activity coefficients of the polarizer and analyzer were assumed to be zero, because both the elements in our ellipsometer are calcite Glan-Thompson prisms having no optical activity.…”

Section: Methodsmentioning

confidence: 99%

Real Time Spectroscopic Ellipsometry Study on Growth Processes of ZrO[sub 2] Thin Films in Metallorganic Chemical Vapor Deposition

Kubota

Hara

Sugimoto

2001

J. Electrochem. Soc.

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The growth process of ZrO 2 thin films, deposited on Pt substrates by metallorganic chemical vapor deposition using zirconium tetraisopropoxide as a precursor, has been studied using a rotating-polarizer multichannel ellipsometer equipped with a chargecoupled device detector. Spectroscopic ellipsometry ͑SE͒ data were collected in a wavelength range of 470-790 nm with a wavelength resolution of ϳ1 nm and a repetition period of 1 s. The SE data could be explained by one-layer and two-layer optical models, which presume a nucleation and coalescence mechanism for the deposition of ZrO 2 films. In the initial state of growth, ZrO 2 clusters are nucleated and grow into islands, which can be simulated by a single nucleating layer. When the cluster islands reach a critical size, they come into contact with one another and a bulk layer grows under a nucleation-generated roughness layer. The growth of the bulk layer starts when the nucleation layer reaches ϳ8 nm thickness. The surface roughness layer stays at ϳ9 nm thickness during the growth stage of the bulk layer, independent of deposition temperature. The substrate temperature has strong influence on the growth rate and the ZrO 2 volume fraction of the bulk layer. The bulk layer formed at 350°C has the highest ZrO 2 volume fraction ͑0.93͒ and a high growth rate ͑0.34 nm s Ϫ1 ). The additional evolution of surface roughness, characterized by a sharp increase in the surface layer thickness, occurs when the deposition is carried at substrate temperatures higher than 400°C.Zirconia ͑ZrO 2 ) thin films have outstanding optical, electrical, chemical, and mechanical properties, which make them of great interest for practical applications. 1 For example, ZrO 2 films have been studied as optical coatings, 2,3 dielectric layers in microelectronics, 4,5 thermal barrier coatings, 6 and protective coatings for magnetic recording media and heads. 7,8 Recently, yttria-stabilized zirconia ͑YSZ͒ films are widely used as buffer layers for the deposition of high-temperature superconducting films 9 and attract attention for use as solid electrolytes for thin film oxygen sensors and fuel cells. 10,11 Zirconia is also characterized by excellent corrosion resistance against corrosive media including strong acid and alkali solutions. 12 Pure ZrO 2 thin films, 12 and ZrO 2 -Ta 2 O 5 and ZrO 2 -TiO 2 double oxide thin films 13,14 can be used as protective coatings having extremely high resistance in corrosive aqueous solutions.Several different methods, such as electron beam evaporation, dc and rf magnetron sputtering, ion beam sputtering, pulsed laser deposition, and metallorganic chemical vapor deposition ͑MOCVD͒, have been employed for the fabrication of ZrO 2 and YSZ thin films. The quality of thin films formed by these physical and chemical vapor deposition ͑CVD͒ techniques is strongly dependent on various parameters of deposition conditions. It is necessary, therefore, to optimize process parameters to produce the films having properties appropriate for the purpose of use. For the formati...

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“…The orientation of the transmission axis of the polarizer is fixed at 45°, and the intensity of the light reflected from the sample is measured as a function of the angle of the rotating analyzer. The two ellipsometric parameters, namely the phase difference D and the amplitude ratio Ψ, are given by [10] D…”

Section: Introductionmentioning

confidence: 99%

Optical trapping of nanoparticles on a silicon subwavelength grating and their detection by an ellipsometric technique

Taki

Mizutani

Iwata

et al. 2015

International Journal of Optomechatronics

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A method and setup are proposed for trapping and detecting nanoparticles dispersed in a nanocomposite solution using periodically localized light generated by a subwavelength transmission grating. By numerical simulations, it is shown that there is an optimum duty ratio of the grating to produce the periodically localized light. Experimental results are presented for Au/γ-Fe 2 O 3 composite nanoparticles having a diameter of 21.0 nm trapped on a silicon subwavelength rectangular grating and detected ellipsometrically. The technique should prove useful for evaluating optical and mechanical properties of nanocomposite materials.

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Error correction for calibration and data reduction in rotating-polarizer ellipsometry: applications to a novel multichannel ellipsometer

Cited by 51 publications

References 18 publications

Multichannel ellipsometer for real time spectroscopy of thin film deposition from 1.5 to 6.5 eV

Multichannel ellipsometer for real time spectroscopy of thin film deposition from 1.5 to 6.5 eV

Real Time Spectroscopic Ellipsometry Study on Growth Processes of ZrO[sub 2] Thin Films in Metallorganic Chemical Vapor Deposition

Optical trapping of nanoparticles on a silicon subwavelength grating and their detection by an ellipsometric technique

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