2008
DOI: 10.1103/physrevb.78.159902
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Erratum: Pentacene homojunctions: Electron and hole transport properties and related photovoltaic responses [Phys. Rev. B77, 195212 (2008)]

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Cited by 29 publications
(39 citation statements)
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“…2,7 It is also a p-dopant in pentacene, as its electron affinity ͑5.24 eV͒ is greater than the ionization energy of the host ͑5.0 eV͒. 2,8,9 Electrical doping is confirmed by recent current-voltage measurements performed in our laboratory, which show an increase in conductivity of more than two orders of magnitude upon doping pentacene with 0.5% F 4 -TCNQ. 10 In the present work, we grow, by thermal evaporation, well ordered multilayer films of pentacene on the ͑001͒ surface of bismuth ͑Bi͒ on Si͑111͒.…”
Section: Introductionsupporting
confidence: 66%
“…2,7 It is also a p-dopant in pentacene, as its electron affinity ͑5.24 eV͒ is greater than the ionization energy of the host ͑5.0 eV͒. 2,8,9 Electrical doping is confirmed by recent current-voltage measurements performed in our laboratory, which show an increase in conductivity of more than two orders of magnitude upon doping pentacene with 0.5% F 4 -TCNQ. 10 In the present work, we grow, by thermal evaporation, well ordered multilayer films of pentacene on the ͑001͒ surface of bismuth ͑Bi͒ on Si͑111͒.…”
Section: Introductionsupporting
confidence: 66%
“…In the common perception, which is clearly inferred from inorganic semiconductor physics, ground-state integer charge transfer (ICT) is thought to occur between OSC and p-(n-)dopant leading to a localized negative (positive) charge on the ionized dopant and a mobile hole (electron), that is, a positive (negative) polaron within the OSC matrix[10,59,[96][97][98][99][100], as schematically illustrated for p-type doping inFigure 4a. This simple picture is frequently found in literature both for doped CPs, as exemplarily shown inFigure 4bfor F 4 TCNQ-doped P3HT[94], and COMs, as shown inFigure 4cfor p-and ndoped PEN[95]: For p-doping, an electron from the HOMO of the OSC is assumed to hop into the LUMO of the electron acceptor, and vice versa for n-doping. In the following, experimental data in pertinent literature is summarized for the doping of both types of OSCs, basis of which the validity of above picture of the fundamental processes at work in the molecular electrical doping of OSCs can be assessed.…”
mentioning
confidence: 97%
“…Copyright 2013 by the American Physical Society. (c) Schematic energy level diagram for p-and n-doping of PEN,where in both cases ICT is assumed[95]. Reprinted figure with permission from K.Harada et al., Phys.…”
mentioning
confidence: 97%
“…For example, the I D value at V D = À2 V and V G = À25 V was improved from À0.21 to À1.36 mA by the contact-area-limited doping in this work. 33,34 In the doped device, the thickness of the tunneling barrier at the source/semiconductor interface is considerably reduced due to a large number of acceptor dopants in the p + layer, resulting in the enhancement of hole injection from the source toward the p + layer. 3, where the major parameters are the impurity concentration of the p layer of 1 Â 10 16 cm À3 and impurity concentration of the p + layer of 1 Â 10 19 cm À3 .…”
Section: View Article Onlinementioning
confidence: 99%