Handbook of Crystal Growth 2015
DOI: 10.1016/b978-0-444-63304-0.00001-9
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Epitaxy for Energy Materials

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Cited by 4 publications
(2 citation statements)
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“…While higher-order compositions may be possible in TF-VLS growth, they would be expected to be difficult as nucleation of off-target phases and phase segregation would need to be completely suppressed. 111 A further challenge in producing a range of III−V materials comes in the form of Al-containing compounds, which have found wide use as window or active layer multijunction III−V PVs 112 as well as sacrificial layers for epitaxial liftoff processes. 113 Although there are historical examples of Alcontaining compounds being grown by HVPE, 109 as yet, no Alcontaining III−V's have been grown in the recent examples of HVPE and CSVT, and no such compounds have been grown by TF-VLS.…”
Section: Acs Energy Lettersmentioning
confidence: 99%
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“…While higher-order compositions may be possible in TF-VLS growth, they would be expected to be difficult as nucleation of off-target phases and phase segregation would need to be completely suppressed. 111 A further challenge in producing a range of III−V materials comes in the form of Al-containing compounds, which have found wide use as window or active layer multijunction III−V PVs 112 as well as sacrificial layers for epitaxial liftoff processes. 113 Although there are historical examples of Alcontaining compounds being grown by HVPE, 109 as yet, no Alcontaining III−V's have been grown in the recent examples of HVPE and CSVT, and no such compounds have been grown by TF-VLS.…”
Section: Acs Energy Lettersmentioning
confidence: 99%
“…A further challenge in producing a range of III–V materials comes in the form of Al-containing compounds, which have found wide use as window or active layer multijunction III–V PVs as well as sacrificial layers for epitaxial liftoff processes . Although there are historical examples of Al-containing compounds being grown by HVPE, as yet, no Al-containing III–V’s have been grown in the recent examples of HVPE and CSVT, and no such compounds have been grown by TF-VLS.…”
mentioning
confidence: 99%